Focused ion beam (FIB) systems have become a useful tool in the failure analysis and modification of microelectronic devices having Si and GaAs structures. The potential of this technique in other areas, e.g. optical and wear-resistant coatings, has not been extensively explored. In this presentation, we report on the application of FIB-based techniques to the investigation of non-semiconductor materials. These materials include : multilayer optical oxide/nitride films, and hard carbide coatings on tool steels. We have found that procedures which are commonly applied for semiconductor materials will produce artifacts but can be applied with some modification to these oxide, carbide, and nitride films, as well as multiphase steel substrates.