The distributions of chemical species and particles inside a silane plasma chemical vapor deposition (PCVD) reactor were theoretically investigated under various plasma conditions. We included the effects of chemical reactions, fluid convection, diffusion and electrical migration on the governing equations of chemical species. The effects of fluid convection, particle diffusion and external forces (ion drag, electrostatic and gravitational forces) on the movement of particles inside the plasma reactor were also examined. The SiH(x)(+) concentration profiles showed sharp peaks at the reactor center, but almost zero in the sheath regions. The concentrations of negative ions in the sheath region became almost zero and most of them were contained inside the bulk plasma. The concentrations of negative ions at the downstream sheath boundary were higher than those at the upstream sheath boundary due to the effect of fluid convection. Most of those particles were located in the region near the sheath boundaries by the balance between the ion drag and electrostatic forces, but the particle concentrations in the sheath region and in the bulk plasma were almost zero. The particle concentrations were greater at the downstream sheath boundary than at the upstream sheath boundary by the effect of fluid convection. As the particle size increased from 0.1 to 10 μm, most particles were located at the downstream sheath boundary by the effect of fluid convection. It was found that the movements of negative ions as well as the positive ions were also important for determining the ion drag force acting on particles in silane PCVD.