화학공학소재연구정보센터
Thin Solid Films, Vol.340, No.1-2, 306-316, 1999
Morphology of sputter deposited Al alloy films
Morphology of Al-2.0at%Ta and Al-2.0 at.% Nd alloy films before and after annealing was investigated for applications of interconnections for liquid crystal displays. It was found that the morphology and the microstructure of Al-2.0 at.% Nd alloy films changed markedly by annealing at the temperature region from 200 degrees C to 300 degrees C, while the morphology of Al-2.0 at.% Ta alloy films did not change by annealing up to 400 degrees C. For the case of Al-2.0 at.% Nd alloy films. the incline of the < 111 > fiber texture to the substrate normal was observed during annealing. Structural characteristics of the Al films were investigated by TEM, SAD and XRD to determine the influence of alloying elements on the morphology and the fiber texture. from these results, it was concluded that the microstructures strongly influence the morphology and the grain orientation of Al alloy films.