Substrate bias and specimen-to-target distance are two important parameters that can be manipulated during preparation of TiN films using a cathodic are ion plating system. Experiments were carried out to deposit TiN on a type 304 stainless steel for different cathode biases ranging from 100 to 300 V and specimen-to-target distances from 150 to 175 mm. Characterization of the microstructure of the TiN-coated steel was done both by transmission and scanning electron microscopy. The results show that the thickness of the TiN coatings increases with decreasing specimen-to-target distance. The TiN coatings exhibit a tapered columnar microstructure and the cone shape of the grains is influenced by the substrate bias. The resistance to deformation of the TiN coatings was evaluated by a Vickers microhardness indenter. It is found that the hardness of the coatings, ranging from 2200 +/- 40 to 1880 +/- 10, decreases with specimen-to-target distance for different substrate biases ranging from 100 to 300 V.