Several homogeneous carbon-boronitride (BCN) coatings were produced with cold-wall chemical vapor deposition varying the temperature of the deposition substrate from 800 degreesC up to 1400 degreesC. The deposition temperature has an influence on the growth rate as well as on the coating composition (C: 35-75 at%; B: 12-40 at%; N: 7-24 at%). Higher substrate temperatures lead to the formation of hemispheres (approximately 10 mum in diameter) on the surface, thus increasing the roughness of the BCN layers. Yet, all the hemispheres of one single sample are made up of the same composition. Furthermore, increasing substrate temperature leads to a rise in the carbon content whereas the ratio between boron and nitrogen is not affected by the substrate temperature, the B:N-ratio being 2:1.