The influence of substrate properties on the growth of thin titanium films was investigated by in situ ultra high vacuum internal stress measurements and by transmission electron microscopy. The substrates were highly ordered TiO2-films. Depositing an increasing number of aluminium monolayers changed the surface properties of the TiO2-substrate. The resulting variation in the substrate properties was monitored via changes in the growth stress of a titanium film deposited on this substrate. The respective stress vs. thickness curves of the titanium film indicate three different growth modes, as a consequence of changes in the properties of the substrate surface. By way of an oxidation/reduction reaction the highly ordered TiO2 surface is transformed to amorphous aluminium oxide and eventually covered by metallic aluminium. (C) 2003 Elsevier Science B.V. All rights reserved.