화학공학소재연구정보센터
Journal of Crystal Growth, Vol.233, No.3, 512-516, 2001
Preparation and properties of lanthanum strontium cobalt films on Si(100) by metallorganic chemical liquid deposition
Lanthanum strontium cobalt La0.5Sr0.5CoO3 (LSCO) films have been grown on Si(1 0 0) substrate by metallorganic chemical liquid deposition (MOCLD) technique using lanthanum acetate, strontium acetate and cobalt acetate as the starting materials. The technique simplified the preparation of LSCO thin films by chemical solution routes. The films were crystallized by rapid thermal annealing (RTA) process. The films annealed between 600 degreesC and 750 degreesC are entirely in the perovskite phase and show good conductivity. The lowest resistivity (950 mu Omega cm) thin films were obtained by annealing at 750 degreesC. The size effect of sheet resistance of the LSCO films has been discussed. PbZr0.5Ti0.5O3 (PZT) films deposited onto LSCO films displayed a good P-E hysteresis characteristic.