Electrochimica Acta, Vol.39, No.8-9, 1057-1065, 1994
Partial Charge-Transfer and Adsorption at Metal-Electrodes - The Underpotential Deposition of Hg(I), Tl(I), Bi(III) and Cu(II) on Polycrystalline Gold Electrodes
The absorption of Hg2(2+), Tl+, Bi3+ and Cu2+ at polycrystalline gold electrodes from aqueous solutions is investigated by potentiostatic step experiments at rotating ring-disk electrodes. The macroscopic partial charge transfer coefficient l is determined from the initial part of the current transients at ring and disk which is diffusion controlled for low reactant concentrations. The measured l are 0.47 (Hg2(2+), 0.61 (Tl+), 0.73 (Bi3+) and 0.92 (Cu2+) +/- 0.03. The potential dependence of the measured l is small and could indicate that the main part of l is caused by microscopic charge transfer lambda. Diffusion controlled formation of the main part of the partially charged adsorbate points to strong repulsive forces between the adsorbed particles. With all of the investigated systems, a second type of deposit has been detected which consists of completely discharged metal.
Keywords:INSITU X-RAY;ABSORPTION FINE-STRUCTURE;SINGLE-CRYSTAL SURFACES;QUARTZ MICROBALANCE;ELECTROSORPTION VALENCY;IMPEDANCE SPECTROMETRY;AQUEOUS-SOLUTIONS;BOND FORMATION;COPPER;LEAD