화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Journal of the Korean Industrial and Engineering Chemistry, Vol.19, No.4, 402-406, August, 2008
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1H,1H,2H,2H-퍼플로로데실메타크릴레이트와 tert-부틸메타크릴레이트로 구성된 공중합체의 합성 및 이산화탄소에서의 리소그라피 특성에 관한 연구
Synthesis of Copolymers Composed of 1H,1H,2H,2H-perfluorodecylmethacrylate and tert-butylmethacrylate and Their Lithographic Properties in Carbon Dioxide
황하수, 이진균1, 박인2, 허훈2, 임권택†
  • 부경대학교 공과대학 화상정보공학부
  • 1코넬대학교 재료공학과
  • 2한국생산기술연구원 환경에너지본부 청정소재팀
Ha Soo Hwang, Jin-kyun Lee1, In Park2, Hoon Huh2, and Kwon Taek Lim†
  • Division of Image and Information Engineering, Pukyong National University, 100 Yongdang-dong, Nam-gu, Busan 608-739, Korea
  • 1Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853, USA
  • 2Green Materials Team, Environment and Energy Division, Korea Institute of Industrial Technology (KITECH), Chungnam330-825, Korea
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초록
자유 라디칼 중합법으로 친 이산화탄소성 단량체인 퍼플로로데실메타크릴레이트(FDMA)와 산에 불안정한 단량체인 tert-부틸메타크릴레이트(TBMA)로 구성된 랜덤 공중합체를 합성하였다. 합성된 공중합체의 이산화탄소에 대한 용해도 특성 및 365 nm 노광에서의 포토레지스트 감도 특성에 관하여 조사하였다. 또한, 랜덤 공중합체를 이용하여 형성된 패턴을 플라즈마 에칭을 통해 전도성 고분자인 poly(styrenesulfonate): poly(3,4-ethylenedioxythiophene) (PSS : PEDOT)에 전사하여 미크론 크기의 PSS : PEDOT 패턴을 제조할 수 있었다.
A series of random copolymers, composed of 1H,1H,2H,2H-perfluoro decyl methacrylate (FDMA) as a CO2-philic monomer and tert-butyl methacrylate (TBMA) as an acid labile monomer, were synthesized by free radical polymerization. The solubility of copolymers in carbon dioxide, light sensitivity at 365 nm exposure, and photoresist pattern formation properties were investigated. Furthermore, sub micron-sized poly(styrenesulfonate) : poly(3,4-ethylenedioxythiophene) (PSS : PEDOT) conducting polymer patterns were successfully prepared by pattern transfer.
Keywords:supercritical carbon dioxide;photoresist;copolymer;conducting polymer
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