Bipolar pulsed magnetron sputtering is used to deposit Al doped ZnO (AZO) on a glass substrate for a transparent conducting oxide in a solar cell structure. A 5 x 25 in.(2) AZO target was sputtered by 50-250 kHz bipolar pulsed dc power supply to deposit a 400 x 400 mm(2) area by swinging back and forth. Sheet resistance, surface morphology, and optical transmittance were measured at different positions on 16 witness samples (small glass slides) to evaluate uniformity. In the thickness of 800 nm, the average value of sheet resistance was 30 Omega/square and the average resistivity was 2.1 x 10(-3) Omega cm. Transmittance was 50%-80% over the visible range. The nonuniformities of thickness, transmittance, and resistivity in the 400 x 400 mm(2) area were 5.8%, 0.8%, and within 9.5%, respectively. (C) 2009 American Vacuum Society. [DOI: 10.1116/1.3242421]