| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 |
36권 1호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Synthesis of Novel Chemically Amplified Photoacid Generator Containing Resist Polymer for Fabrication of Positivetone Nanostructure |
| 초록 |
Photoacid generators (PAGs) have been widely used as a key component in resist materials. Triphenylsulfonium salt methacrylate (TPSMA) as the PAG was employed for synthesis of terpolymers, poly(EAMA-co-MMA-co-TPSMA) by free radical polymerization. 2-Ethyl-2-adamantyl-methacrylate (EAMA) was used for deprotection reaction for polarity change which results a positive tone photoresists and utilized 2.38% TMAH as developer. Based on PAGs, polymer with low molecular weight were synthesized and characterized. The characterization of polymers was carried out by UV, IR and 1H NMR , TGA,DSC. Results were in good agreements with corresponding chemical compositions and thermal stability. In lithographic performance of photoresists was investigated by ArF, KrF, Electron beam Lithography. The resist patterns were confirmed systematically according to dose (mJ/cm2) and pitch, exposed line width for the fabrication of nano-scale patterns. |
| 저자 |
김민정, 손경화, 권오정, 강하나, 해먼트 수렌드라 몬드카, 이해원
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| 소속 |
한양대 |
| 키워드 |
positive photoresist; lithography; photoacid generators
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| E-Mail |
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