| 초록 |
The protected 4-hydroxystyrene-based polymer is generally used as a photoresist material because its solubility changes after the deprotection reaction. The purpose of this study is to polymerize 1-(1-ethoxyethoxy)-4-vinylvenzene, 4-tert-butoxystyrene, 4-(2-tetrahydropyranyloxy)styrene monomers into homopolymer and copolymer by anionic polymerization, and to evaluate the physical properties. Polymerization was carried out at -40°C for 3 days with a s-BuLi initiator, and the synthesized polymer was measured by GPC, DSC, and 1H-NMR. As a result, it was confirmed that the protected 4-hydroxystyrene-based polymer having a molecular weight of about 10 kg/mol and molecular weight distribution of 1.1 was synthesized. Finally, the poly(4-hydroxystyene) was prepared through a deprotection reaction under mild conditions. |
