화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2018년 봄 (04/04 ~ 04/06, 대전컨벤션센터)
권호 43권 1호
발표분야 기능성 고분자
제목 Synthesis and characterization of polybenzoxazole for positive-tone photoresist
초록 Polybenzoxazole was synthesized by polymerizing various polyhydroxyamide precursors and it was confirmed that Pattern performed well using SEM which was confirmed to be synthesized using FT-IR and FT-NMR. PHA was synthesized using 0.2 eq of phthalic, Succinic anhydride, and maleic anhydride was synthesized at 0.1, 0.2, 0, 3 eq. All PHA synthesized was well dissolved in a flying solvent such as NMP, DMAc, DMSO. All synthesized PHAs were well dissolved in solvents such as NMP, DMAc, DMSO and others. The silicon wafer was fabricated at 3 cm x 3 cm and spin coated at 1000 rpm for 50 sec. Prebake was at 130 ~ 150 ℃ for 5 minutes. Develop was carried out using tetramethylammonium hydroxide aqueous solution 2.38%, and the development time was adjusted in order to form the best line. As a result, phthalic anhydride and succinic anhydride got inappropriate results, maleic anhydride was able to obtain very excellent results, good results were obtained in the order of 0.2, 0.1, 0.3.
저자 박주현, 이승우, 문관호
소속 영남대
키워드 polybenzoxazole; photoresist
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