| 초록 |
Vapor-deposition material needs high thermal stability and must be maintained the purity over long term use under high temperature. For example, organometallic precursors for atomic layer deposition (ALD) that have metal atoms bound to cyclopentadienyl, are kept at a sufficiently high temperature due to their low volatility. Thus, relatively weak organic ligands can be thermally decomposed and form impurities which can further accelerate degradation. Thermal degradation of organic materials used in vacuum thermal evaporation also slowly occurs due to continuous high temperature stress, which causes deterioration of physical properties and reliability of thin film. In this study, we have developed a technique to assess thermal stability and lifetime of vapor-deposition materials such as tris(dimethylamino) cyclopentadienyl zirconium, N,N'-bis(naphthalen-1-yl)-N,N'-bis(phenyl)-benzidine (NPB) and 4,4'-bis(carbazol-9-yl)biphenyl (CBP) through accelerated thermal degradation test. |
