| 학회 |
한국화학공학회 |
| 학술대회 |
2018년 봄 (04/25 ~ 04/27, 창원컨벤션센터) |
| 권호 |
24권 1호, p.776 |
| 발표분야 |
재료 |
| 제목 |
3D Feature profile simulation for oxide etching under fluorocarbon/oxygen mixture plasma |
| 초록 |
Recently, plasma etching for sub-10nm device is emerging as one of the challenges in semiconductor manufacturing process. Lack of basic understanding of most of these processes makes it difficult to develop next-generation process due to their complexity. As a part of an effort to overcome these limitations, we have developed a 3D feature profile simulator strongly coupled with Zero-D bulk plasma module. In this work, the 3D feature profile simulator is integrated with a reasonable plasma database for bulk and surface reactions for fluorocarbon/oxygen mixture plasma etching. The effect of oxygen in fluorocarbon plasma is highlighted in 3D feature profile simulation for contact hole etch, and verified with experimental data. |
| 저자 |
박재형1, 유혜성1, 육영근1, 유동훈2, 임연호1
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| 소속 |
1전북대, 2경원테크 |
| 키워드 |
화공소재 전반 |
| E-Mail |
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| 원문파일 |
초록 보기 |
