화학공학소재연구정보센터
검색결과 : 28건
No. Article
1 Assigning chemical configurations to the XPS features observed at pristine (100) Si surface resulting after etching in HF aqueous solution
Cerofolini GF, Romano E, Narducci D, Belanzoni P, Giorgi G
Applied Surface Science, 256(21), 6330, 2010
2 Influence of chemical additives on the surface reactivity of Si in KOH solution
Philipsen HGG, Kelly JJ
Electrochimica Acta, 54(13), 3526, 2009
3 Growth kinetics of Si and SiGe on Si(100), Si(110) and Si(111) surfaces
Hartmann JM, Burdin M, Rolland G, Billon T
Journal of Crystal Growth, 294(2), 288, 2006
4 Atom manipulation and image artifact on Si(111)7 x 7 surface using a low temperature noncontact atomic force microscope
Sugawara Y, Sano Y, Suehira N, Morita S
Applied Surface Science, 188(3-4), 285, 2002
5 Influence of the plasma pretreatment of GaAs(100) and Si(100) surfaces on the optical and structural properties of Si3N4/GaAs and a-SiGe/Si interfaces
Pincik E, Jergel M, Kucera M, van Swaaij RACMM, Ivanco J, Senderak R, Zeman M, Mullerova J, Brunel M
Applied Surface Science, 166(1-4), 72, 2000
6 Kinetic study of 3C-SiC growth on Si by pyrolyzing tetramethysilane in low pressure radio frequency-induction heated chemical vapor deposition reactor
Kim KC, Nahm KS, Hahn YB, Lee YS, Byun HS
Journal of Vacuum Science & Technology A, 18(3), 891, 2000
7 The heteroepitaxy of II-VI compounds on the non-isovalent substrates (ZnTe/Si)
Sidorov YG, Yakushev MV, Pridachin DN, Varavin VS, Burdina LD
Thin Solid Films, 367(1-2), 203, 2000
8 Initial stages of heteroepitaxy of GaP on selected silicon surfaces
Sukidi N, Bachmann KJ, Narayanan V, Mahajan S
Journal of the Electrochemical Society, 146(3), 1147, 1999
9 Nickel-induced effect on the surface morphology of rapid-quenched Si(111)
Fukuda T
Journal of Vacuum Science & Technology A, 17(5), 2800, 1999
10 Infrared study of Si surfaces and buried interfaces
Milekhin A, Friedrich M, Hiller K, Wiemer M, Gessner T, Zahn DRT
Journal of Vacuum Science & Technology B, 17(4), 1733, 1999