| 1 |
Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition
Schlupp MVF, Prestat M, Martynczuk J, Rupp JLM, Bieberle-Hutter A, Gauckler LJ
Journal of Power Sources, 202, 47, 2012 |
| 2 |
Boron doping: B/H/C/O gas-phase chemistry; H atom density dependences on pressure and wire temperature; puzzles regarding the gas-surface mechanism
Mankelevich YA, Ashfold MNR, Comerford DW, Ma J, Richley JC
Thin Solid Films, 519(14), 4421, 2011 |
| 3 |
High efficiency microcrystalline silicon solar cells with Hot-Wire CVD buffer layer
Finger F, Mai Y, Klein S, Carius R
Thin Solid Films, 516(5), 728, 2008 |
| 4 |
Characterization and cytocompatibility of carbon layers prepared by photo-induced chemical vapor deposition
Kubova O, Svorcik V, Heitz J, Moritz S, Romanin C, Matejka P, Mackova A
Thin Solid Films, 515(17), 6765, 2007 |
| 5 |
Comparative photoemission study of the electronic properties of L-CVD SnO2 thin films
Kwoka M, Ottaviano L, Passacantando M, Czempik G, Santucci S, Szuber J
Applied Surface Science, 252(21), 7734, 2006 |
| 6 |
Deposition of alpha-alumina via combustion chemical vapor deposition
Kelekanjeri VSKG, Carter WB, Hampikian JM
Thin Solid Films, 515(4), 1905, 2006 |
| 7 |
Characterization of low temperature photo-assisted metal-organic chemical vapor deposited copper films using hexafluoroacetylacetonate copper(I) trimethylvinylsilane as precursor
Wu YL, Hsieh MH, Hwang HL
Thin Solid Films, 483(1-2), 10, 2005 |
| 8 |
High-speed deposition of zirconia films by laser-induced plasma CVD
Goto T
Solid State Ionics, 172(1-4), 225, 2004 |
| 9 |
Optimization of the filament arrangement at constant radiant heat in HW-CVD for the preparation of compact mu c-Si : H at high deposition rates
Lossen J, Klein S, Finger F
Thin Solid Films, 451-52, 531, 2004 |
| 10 |
Texture evolution in TiN, TaN and W2N thin films
Kim I, Dost S
Materials Science Forum, 408-4, 1591, 2002 |
