화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Growth and characterization of epitaxial Ti3GeC2 thin films on 4H-SiC(0001)
Buchholt K, Eklund P, Jensen J, Lu J, Ghandi R, Domeij M, Zetterling CM, Behan G, Zhang H, Spetz AL, Hultman L
Journal of Crystal Growth, 343(1), 133, 2012
2 Kinetic Model of SiGe Selective Epitaxial Growth using RPCVD Technique
Kolahdouz M, Maresca L, Ghandi R, Khatibi A, Radamson HH
Journal of the Electrochemical Society, 158(4), H457, 2011
3 Selective epitaxial growth of B-doped SiGe and HCl etch Si for the formation of SiGe:B recessed source and drain (pMOS transistors)
Radamson HH, Kolahdouz M, Ghandi R, Hallstedt J
Thin Solid Films, 517(1), 84, 2008
4 The influence of Si coverage in a chip on layer profile of selectively grown Si(1-x)Ge(x) layers using RPCVD technique
Kolahdouz M, Ghandi R, Hallstedt J, Osling M, Wise R, Wejtmans H, Radamson HH
Thin Solid Films, 517(1), 257, 2008
5 Effect of strain, substrate surface and growth rate on B-doping in selectively grown SiGe layers
Ghandi R, Kolahdouz M, Hallstedt J, Wise R, Wejtmans H, Radamson HH
Thin Solid Films, 517(1), 334, 2008