화학공학소재연구정보센터
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No. Article
1 SCALPEL mark detection using Si/SiO2 and 100 keV backscattered electrons
Farrow RC, Mkrtchyan M, Kizilyalli IC, Waskiewicz WK, Hopkins LC, Alakan A, Gibson G, Brown P, Misra S, Trimble L
Journal of Vacuum Science & Technology B, 19(5), 1852, 2001
2 Linewidth reduction using liquid ashing for sub-100 nm critical dimensions with 248 nm lithography
Timko AG, Frackoviak J, Hopkins LC, Klemens FP, Trimble LE, Nalamasu O, Watson GP, Mansfield WM, Barr D, Li J
Journal of Vacuum Science & Technology B, 19(6), 2713, 2001
3 Application of transmission electron detection to SCALPEL mask metrology
Farrow RC, Postek MT, Keery WJ, Jones SN, Lowney JR, Blakey M, Fetter LA, Griffith JE, Liddle JA, Hopkins LC, Huggins HA, Peabody M, Novembre A
Journal of Vacuum Science & Technology B, 15(6), 2167, 1997
4 Wall angle measurement with a scanning probe microscope employing a one-dimensional force sensor
Griffith JE, Hopkins LC, Bryson CE, Berghaus A, Snyder EJ, Plombon JJ, Vasilyev LA, Hecht M, Bindell JB
Journal of Vacuum Science & Technology B, 15(6), 2189, 1997
5 Polycrystalline Tungsten and Iridium Probe Tip Preparation with a Ga+ Focused Ion-Beam
Hopkins LC, Griffith JE, Harriott LR, Vasile MJ
Journal of Vacuum Science & Technology B, 13(2), 335, 1995
6 Dimensional Metrology with Scanning Probe Microscopes
Griffith JE, Marchman HM, Miller GL, Hopkins LC
Journal of Vacuum Science & Technology B, 13(3), 1100, 1995
7 Edge Position Measurement with a Scanning Probe Microscope
Griffith JE, Marchman HM, Hopkins LC
Journal of Vacuum Science & Technology B, 12(6), 3567, 1994
8 Line-Profile Measurement with a Scanning Probe Microscope
Griffith JE, Marchman HM, Miller GL, Hopkins LC, Vasile MJ, Schwalm SA
Journal of Vacuum Science & Technology B, 11(6), 2473, 1993