화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 14 nm node FinFETs
Qin CL, Wang GL, Kolahdouz M, Luo J, Yin HX, Yang P, Li JF, Zhu HL, Chao Z, Ye TC, Radamson HH
Solid-State Electronics, 124, 10, 2016
2 New method to calibrate the pattern dependency of selective epitaxy of SiGe layers
Kolahdouz M, Maresca L, Ostling M, Riley D, Wise R, Radamson HH
Solid-State Electronics, 53(8), 858, 2009
3 The influence of Si coverage in a chip on layer profile of selectively grown Si(1-x)Ge(x) layers using RPCVD technique
Kolahdouz M, Ghandi R, Hallstedt J, Osling M, Wise R, Wejtmans H, Radamson HH
Thin Solid Films, 517(1), 257, 2008