| 1 |
Planarization processes and applications III. As-deposited and annealed film properties
Croswell RT, Reisman A, Simpson DL, Temple D, Williams CK
Journal of the Electrochemical Society, 147(4), 1513, 2000 |
| 2 |
Deposition and characterization of undoped and boron and phosphorus doped (SixGe1-xO2) glass films
Simpson DL, Croswell RT, Reisman A, Williams CK, Temple D
Journal of the Electrochemical Society, 147(4), 1560, 2000 |
| 3 |
Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data I. Deposition parameters
Soman R, Reisman A, Temple D, Alberti R
Journal of the Electrochemical Society, 147(5), 1847, 2000 |
| 4 |
Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: Experimental data II. Morphology and composition as a function of deposition parameters
Soman R, Reisman A, Temple D, Alberti R, Pace C
Journal of the Electrochemical Society, 147(5), 1854, 2000 |
| 5 |
Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis I. The system Si-Ge-Cl-H
Soman R, Reisman A, Temple D
Journal of the Electrochemical Society, 147(11), 4333, 2000 |
| 6 |
Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: A thermodynamic analysis II. The system Si-Ge-Cl-H-Ar
Soman R, Reisman A, Temple D
Journal of the Electrochemical Society, 147(11), 4342, 2000 |
| 7 |
An alternative derivation for the equilibrium constant of binary solid solution-vapor systems
Soman R, Reisman A, Temple D
Journal of the Electrochemical Society, 146(10), 3817, 1999 |
| 8 |
Planarization processes and applications - I. Undoped GeO2-SiO2 glasses
Simpson DL, Croswell RT, Reisman A, Temple D, Williams CK
Journal of the Electrochemical Society, 146(10), 3860, 1999 |
| 9 |
Planarization processes and applications - II. B2O3/P2O5 doped GeO2-SiO2 classes
Simpson DL, Croswell RT, Reisman A, Temple D, Williams CK
Journal of the Electrochemical Society, 146(10), 3872, 1999 |
| 10 |
Differential thermal analysis of glass mixtures containing SiO2, GeO2, B2O3, and P2O5
Croswell RT, Reisman A, Simpson DL, Temple D, Williams CK
Journal of the Electrochemical Society, 146(12), 4569, 1999 |
