화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 N-channel MOSFETs fabricated on He-implanted and annealed SiGe buffer layers
Mooney PM, Rim K, Christiansen SH, Chan KK, Chu JO, Cai J, Chen H, Jordan-Sweet JL, Yang YY, Boyd DC
Solid-State Electronics, 49(10), 1669, 2005
2 The revolution in SiGe: impact on device electronics
Harame DL, Koester SJ, Freeman G, Cottrel P, Rim K, Dehlinger G, Ahlgren D, Dunn JS, Greenberg D, Joseph A, Anderson F, Rieh JS, Onge SAST, Coolbaugh D, Ramachandran V, Cressler JD, Subbanna S
Applied Surface Science, 224(1-4), 9, 2004
3 Performance assessment of scaled strained-Si channel-on-insulator (SSOI) CMOS
Kim K, Chuang CT, Rim K, Joshi RV
Solid-State Electronics, 48(2), 239, 2004
4 Strained SiCMOS (SS CMOS) technology: opportunities and challenges
Rim K, Anderson R, Boyd D, Cardone F, Chan K, Chen H, Christansen S, Chu J, Jenkins K, Kanarsky T, Koester S, Lee BH, Lee K, Mazzeo V, Mocuta A, Mocuta D, Mooney PM, Oldiges P, Ott J, Ronsheim P, Roy R, Steegen A, Yang M, Zhu H, Ieong M, Wong HSP
Solid-State Electronics, 47(7), 1133, 2003
5 Comparison of Si/Si1-x-yGexCy and Si/Si1-yCy heterojunctions grown by rapid thermal chemical vapor deposition
Hoyt JL, Mitchell TO, Rim K, Singh DV, Gibbons JF
Thin Solid Films, 321(1-2), 41, 1998