검색결과 : 10건
No. | Article |
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1 |
Influence of CH4 flow rate on properties of HF-PECVD a-SiC films and solar cell application Lien SY, Weng KW, Huang JJ, Hsu CH, Shen CT, Wang CC, Lin YS, Wuu DS, Wu DC Current Applied Physics, 11(1), S21, 2011 |
2 |
Formation of Sn metal spheres by plasma treatment Han DH, Kwon SH, Lee JJ Thin Solid Films, 519(20), 7106, 2011 |
3 |
Surface modification of fluorocarbon polymer films for improved adhesion using atmospheric-pressure nonthermal plasma graft-polymerization Okubo M, Tahara M, Saeki N, Yamamoto T Thin Solid Films, 516(19), 6592, 2008 |
4 |
Characterisation of ultrashort pulse laser ablation of SmBaCuO D'Alessio L, De Bonis A, Galasso A, Morone A, Santagata A, Teghil R, Villani P, Zaccagnino M Applied Surface Science, 248(1-4), 295, 2005 |
5 |
Effect of oxygen plasma treatment on low dielectric constant carbon-doped silicon oxide thin films Wang YH, Kumar R, Zhou X, Pan JS, Chai JW Thin Solid Films, 473(1), 132, 2005 |
6 |
Preparation, characterization and electronic and optical properties of plasma-polymerized nitriles Hu X, Zhao XY, Uddin A, Lee CB Thin Solid Films, 477(1-2), 81, 2005 |
7 |
Thermal plasma synthesis of BaFe12O19 (BaM) films Vidal EE, Taylor PR Plasma Chemistry and Plasma Processing, 23(4), 609, 2003 |
8 |
Plasma deposition of thin film silicon: kinetics monitored by optical emission spectroscopy Feitknecht L, Meier J, Torres P, Zurcher J, Shah A Solar Energy Materials and Solar Cells, 74(1-4), 539, 2002 |
9 |
Gate Quality Si3N4 Prepared by Low-Temperature Remote Plasma-Enhanced Chemical-Vapor-Deposition for III-V Semiconductor-Based Metal-Insulator-Semiconductor Devices Park DG, Tao M, Li D, Botchkarev AE, Fan Z, Wang Z, Mohammad SN, Rockett A, Abelson JR, Morkoc H, Heyd AR, Alterovitz SA Journal of Vacuum Science & Technology B, 14(4), 2674, 1996 |
10 |
Characterization of Silicon-Nitride Films Formed by Synchrotron Radiation-Excited Chemical-Vapor-Deposition Kyuragi H Journal of Vacuum Science & Technology B, 14(5), 3305, 1996 |