화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Evidence of strong spin-orbit interaction in strained epitaxial germanium
Morrison C, Foronda J, Wisniewski P, Rhead SD, Leadley DR, Myronov M
Thin Solid Films, 602, 84, 2016
2 Potentialities of disilane for the low temperature epitaxy of intrinsic and boron-doped SiGe
Hartmann JM, Benevent V, Veillerot M, Halimaoui A
Thin Solid Films, 557, 19, 2014
3 Mushroom-free selective epitaxial growth of Si, SiGe and SiGe:B raised sources and drains
Hartmann JM, Benevent V, Barnes JP, Veillerot M, Lafond D, Damlencourt JF, Morvan S, Previtali B, Andrieu F, Loubet N, Dutartre D
Solid-State Electronics, 83, 10, 2013
4 A benchmarking of silane, disilane and dichlorosilane for the low temperature growth of group IV layers
Hartmann JM, Benevent V, Damlencourt JF, Billon T
Thin Solid Films, 520(8), 3185, 2012
5 High-temperature growth of very high germanium content SiGe virtual substrates
Bogumilowicz Y, Hartmann JM, Di Nardo C, Holliger P, Papon AM, Rolland G, Billon T
Journal of Crystal Growth, 290(2), 523, 2006
6 Growth kinetics of Si and SiGe on Si(100), Si(110) and Si(111) surfaces
Hartmann JM, Burdin M, Rolland G, Billon T
Journal of Crystal Growth, 294(2), 288, 2006
7 High germanium content SiGe virtual substrates grown at high temperatures
Bogumilowicz Y, Hartmann JM, Laugier F, Rolland G, Billon T, Cherkashin N, Claverie A
Journal of Crystal Growth, 283(3-4), 346, 2005