검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD Zhu YH, Wang W, Jia XY, Akasaka T, Liao S, Watari F Applied Surface Science, 262, 156, 2012 |
| 2 |
Deposition of SiC filmsby ion-enhanced plasma chemical vapor deposition using tetramethylsilane plus H-2 Yoshino M, Shimozuma M, Date H, Itoh H, Tagashira H Thin Solid Films, 492(1-2), 207, 2005 |
| 3 |
Radio frequency power dependence of the characteristics of 3C-SiC on Si grown by triode plasma CVD using dimethylsilane Yasui K, Hashiba M, Akahane T Applied Surface Science, 216(1-4), 580, 2003 |
| 4 |
Comparison of the growth characteristics of SiC on Si between low-pressure CVD and triode plasma CVD Yasui K, Hashiba M, Narita Y, Akahane T Materials Science Forum, 389-3, 367, 2002 |
| 5 |
Growth of high quality silicon carbide films on Si by triode plasma CVD using monomethylsilane Yasui K, Asada K, Maeda T, Akahane T Applied Surface Science, 175, 495, 2001 |