Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.14, No.1 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (42 articles)

1 - 6	Processing of PbTiO3 Thin-Films .1. In-Situ Investigation of Formation Kinetics Li CC, Desu SB
7 - 12	Processing of PbTiO3 Thin-Films .2. In-Situ Investigation of Stress-Relaxation Li CC, Desu SB
13 - 21	Processing of PbTiO3 Thin-Films .3. Effects of Ion-Bombardment Li CC, Desu SB
22 - 29	Surface-Diffusion of in on Si(111) - Evidence for Surface-Ionization Effects Allen CE, Ditchfield R, Seebauer EG
30 - 33	Growth of Thin Ti Films on Si(111)-(7X7) Surfaces Saleh AA, Peterson LD
34 - 37	Enhanced Deposition Rate of Lithium Phosphorus Oxynitride Thin-Films by Sputtering of Li3Po4 in N-2-He Gas-Mixtures Bates JB, Yu XH
38 - 45	In-Situ Analysis of the Tribochemical Films Formed by SiC Sliding Against Mo in Partial Pressures of SO2, O-2, and H2S Gases Singer IL, Lemogne T, Donnet C, Martin JM
46 - 51	Superhard Nanocrystalline W2N/Amorphous Si3N4 Composite-Materials Veprek S, Haussmann M, Reiprich S
52 - 55	Contact Potential Measurements of Hard-Disk Drive Surfaces in Humid Environments Zanoria ES, Danyluk S, Zharin AL, Bhatia CS
56 - 62	Structural and Mechanical-Properties of Carbon Nitride Cnx (0.2-Less-Than-or-Equal-to-X-Less-Than-or-Equal-to-0.35) Films Sjostrom H, Hultman L, Sundgren JE, Hainsworth SV, Page TF, Theunissen GS
63 - 68	Optical Multilayer Films Based on an Amorphous Fluoropolymer Chow R, Loomis GE, Ward RL
69 - 79	Surface Chemical-State Populations in the Molecular-Beam Epitaxy Deposition of BaF2 on GaAs by X-Ray Photoelectron-Spectroscopy and Heavy-Ion Backscattering Spectroscopy Stumborg MF, Chu TK, Santiago F, Price JL, Guardala NA, Land DJ
80 - 88	Chemical and Matrix Effects on Sensitivity Factors in Electron Spectroscopies .1. C and Si Containing Materials Ke R, Haasch RT, Finnegan N, Dottl LE, Alkire RC, Farrell HH
89 - 94	Assessment of Overlayer Thickness Determination Model by Controlled Monolayers Beard BC, Brizzolara RA
95 - 103	High-Resolution Electron-Energy-Loss Spectroscopy and Infrared-Spectroscopy of Polymer Surfaces - High-Resolution and Orientation Effects of Polytetrafluoroethylene Films Akavoor P, Menezes W, Kesmodel LL, Apai G, Mckenna WP
104 - 109	Exoelectron Emission from Nickel-Oxide Film and Its Relationship to the Reduction by Ethanol Vapor Momose Y, Iwanami K, Seki J
110 - 114	Excimer-Laser Assisted Growth of Au Thin-Films on Mica(001) Polanski G, Rubahn HG
115 - 117	High-Power Density Pulsed Plasma Deposition of Titanium Carbonitride Yan PX, Yang SZ, Li B, Chen XS
118 - 124	Amorphous Oxygen-Containing Hydrogenated Carbon-Films Formed by Plasma-Enhanced Chemical-Vapor-Deposition Durrant SF, Castro SG, Cisneros JI, Dacruz NC, Demoraes MA
125 - 131	Laser-Induced Dissociation of Molecules During Measurements of Hydrogen-Atoms in Processing Plasmas Using 2-Photon Laser-Induced Fluorescence Miyazaki K, Kajiwara T, Uchino K, Muraoka K, Okada T, Maeda M
132 - 138	Sheath Impedance Effects in Very High-Frequency Plasma-Experiments Schwarzenbach W, Howling AA, Fivaz M, Brunner S, Hollenstein C
139 - 143	Uniformity of Radio-Frequency Bias Voltages Along Conducting Surfaces in a Plasma Stevens JE, Sowa MJ, Cecchi JL
144 - 151	Measurements of Electron-Temperature, Electron-Density, and Neutral Density in a Radiofrequency Inductively-Coupled Plasma Hori T, Bowden MD, Uchino K, Muraoka K, Maeda M
152 - 155	Atomic Nitrogen-Production in a High-Efficiency Microwave Plasma Source Mccullough RW, Geddes J, Croucher JA, Woolsey JM, Higgins DP, Schlapp M, Gilbody HB
156 - 164	X-Ray Photoelectron Study of the Reactive Ion Etching of Sixge1-X Alloys in SF6 Plasmas Peignon MC, Cardinaud C, Turban G, Charles C, Boswell RW
165 - 169	Intrinsic Stress and Its Relaxation in Diamond Film Deposited by Hot-Filament Chemical-Vapor-Deposition Choi SK, Jung DY, Choi HM
170 - 183	Cold-Wall Ultrahigh-Vacuum Chemical-Vapor-Deposition of Doped and Undoped Si and Si1-xGex Epitaxial-Films Using SiH4 and Si2H6 Li C, John S, Quinones E, Banerjee S
184 - 193	Thermooxidative Erosion of Amorphous Hydrogenated Carbon-Films Haasz AA, Chiu S, Pierre JE, Gudimenko YI
194 - 196	Structural-Analysis of Hydrogenated Carbon-Films Obtained by Reactive Direct-Current Magnetron Sputtering Fujimaki S, Matsumoto H, Kokaku Y, Kitoh M, Tsumita N
197 - 202	Further-Studies of Ion-Beam-Assisted Deposition of Si-C Films in Reactive Environments He ZG, Inoue S, Carter G
203 - 209	Ion Incident Angle Dependence of Material Properties of a Zrn Film on Silicon Prepared by the Ion-Assisted Deposition Method Horita S, Akahori H, Kobayashi M
210 - 215	Transmission Electron-Microscopy Investigation of Biaxial Alignment Development in YSZ Films Fabricated Using Ion-Beam-Assisted Deposition Mcintyre PC, Ressler KG, Sonnenberg N, Cima MJ
216 - 222	Interaction of 50 eV Electrons with D2O on GaAs(100) Sloan DW, Sun YM, White JM
223 - 228	A Radiofrequency Bandpass Mass Filter for Broad Ion-Beams Schlemm H
229 - 233	Low-Energy Ar Ion-Induced and Chlorine Ion Etching of Silicon Balooch M, Moalem M, Wang WE, Hamza AV
234 - 239	Neon Ion-Beam-Induced Surface-Reactions of SF6 Adsorbed Molecules with Silicon at Low-Temperature Royer J, Tessier PY, Grolleau B, Turban G
240 - 244	Determination of the Lateral Spread of Xe Ions in Silicon-Nitride and Hydrated Silicon-Nitride Films by Oblique-Incidence Rutherford Backscattering Wang KM, Qu BD, Shi BR, Lu F, Meng MQ, Wang ZL, Wang W, Ding PJ
245 - 250	Application of the Monte-Carlo Method to Pressure Calculation Suetsugu Y
251 - 255	Substrate Effects in Cubic Boron-Nitride Film Formation Mirkarimi PB, Mccarty KF, Cardinale GF, Medlin DL, Ottesen DK, Johnsen HA
256 - 257	Solid-State Ambient-Temperature Ultrahigh-Vacuum Iodine Source Furman SA, Harrington DA
258 - 259	Design of a Magnetron Sputter Source with Soft-X-Ray Monitoring Capabilities Edart S, Dauchot JP
260 - 265	Universal Calibration of W5-Percent-Re vs W26-Percent-Re (Type-C) Thermocouples in the Temperature-Range 32-2588 K Smentkowski VS, Yates JT