L41 - L44 |
Study of substrate-directed ordering of long double-stranded DNA molecules on bare highly oriented pyrolytic graphite surface based on atomic force microscopy relocation imaging Wang HB, An HJ, Zhang F, Zhang ZX, Ye M, Xiu P, Zhang Y, Hu J |
1637 - 1646 |
Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation Sumiya M, Bruce R, Engelmann S, Weilnboeck F, Oehrlein GS |
1647 - 1653 |
Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation Sumiya M, Bruce R, Engelmann S, Weilnboeck F, Oehrlein GS |
1654 - 1659 |
Comparative study of thermally cured and electron-beam-exposed hydrogen silsesquioxane resists Choi S, Word MJ, Kumar V, Adesida I |
1660 - 1665 |
Nanofabrication by mechanical and electrical processes using electrically conductive diamond tip Miyake S, Zheng HF, Kim J, Wang M |
1666 - 1669 |
Sub-50-nm track pitch mold using electron beam lithography for discrete track recording media Sbiaa R, Tan EL, Seoh RM, Aung KO, Wong SK, Piramanayagam SN |
1670 - 1674 |
Oxidation behavior of In95Sn5 solid solution Ramasamy S, Sabarinathan V, Agarwal N, Smith DJ |
1675 - 1683 |
Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP Carlstrom CF, van der Heijden R, Andriesse MSP, Karouta F, van der Heijden RW, van der Drift E, Salemink HWM |
1684 - 1689 |
Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography Ting YH, Park SM, Liu CC, Liu XS, Himpsel FJ, Nealey PF, Wendt AE |
1690 - 1695 |
Fabrication of concave gratings by curved surface UV-nanoimprint lithography Chen YP, Lee YP, Chang JH, Wang LA |
1696 - 1699 |
Growth of nitrogen doped ZnO films through a nitrogen diffusion process from WN films formed by a cosputtering technique Lee J, Ha J, Hong J, Cha S, Paik U |
1700 - 1704 |
Field-emission fluorescent lamp using carbon nanotubes on a wire-type cold cathode and a reflecting anode Huang JX, Chen J, Deng SZ, She JC, Xu NS |
1705 - 1711 |
Fabrication and properties of Cu-Ni mixed-metal periodical array for midinfrared filtering and hydrophobic application Huang WH, Yang YL, Wu SC |
1712 - 1717 |
Correlation of the growth rate for selective epitaxial growth of silicon and oxide thickness and oxide coverage in a reduced pressure chemical vapor deposition pancake reactor Lee KY |
1718 - 1722 |
Optical properties and critical-point energies of BaTiO3 (001) from 1.5 to 5.2 eV Choi SG, Dattelbaum AM, Picraux ST, Srivastava SK, Palmstrom CJ |
1723 - 1727 |
Comparative study of ZrN and Zr-Ge-N thin films as diffusion barriers for Cu metallization on Si Leu LC, Sadik P, Norton DP, McElwee-White L, Anderson TJ |
1728 - 1731 |
Nanochannels fabricated in polydimethylsiloxane using sacrificial electrospun polyethylene oxide nanofibers Bellan LM, Strychalski EA, Craighead HG |
1732 - 1739 |
Programmable proximity aperture lithography with MeV ion beams Puttaraksa N, Gorelick S, Sajavaara T, Laitinen M, Singkarat S, Whitlow HJ |
1740 - 1744 |
Comparison of selective Ge growth in SiO2 trenches on Si(001) and on blanket Si(001) substrates: Surface roughness and doping Park JS, Curtin M, Hydrick JM, Carroll M, Fiorenza JG, Lochtefeld A, Novak S |
1745 - 1747 |
Large areas of periodic nanoholes perforated in multistacked films produced by lift-off Wu W, Dey D, Katsnelson A, Memis OG, Mohseni H |
1748 - 1752 |
Self-aligned metal-contact and passivation technique for submicron ridge waveguide laser fabrication Teng JH, Lim EL, Chua SJ, Ang SS, Chong LF, Dong JR, Yin R |
1753 - 1756 |
Iterative imprint for multilayered nanostructures by feeding, vacuum forming, and bonding of sheets Suzuki H, Nagato K, Sugimoto S, Tsuchiya K, Hamaguchi T, Nakao M |
1757 - 1760 |
Electron field emission from ZnOx nanoparticles decorated on vertically aligned carbon nanotubes prepared by vapor-phase transport Wisitsoraat A, Tuantranont A, Patthanasettakul V, Mongpraneet S |
1761 - 1764 |
Fabrication of gold tips suitable for tip-enhanced Raman spectroscopy Williams C, Roy D |
1765 - 1770 |
Effect of ZnO catalyst on carbon nanotube growth by thermal chemical vapor deposition Lee SF, Chang YP, Lee LY |
1771 - 1774 |
Single-pass forming for three-dimensional microstructures by high-speed shearing of multilayer thin films Hamaguchi T, Yonemoto H, Nagato K, Tsuchiya K, Nakao M |
1775 - 1781 |
ArF resist-friendly etching technology Hayashi T, Morikawa Y, Suu K, Ishikawa M |
1782 - 1786 |
Specific spectral features in electron emission from nanocrystalline silicon quasi-ballistic cold cathode detected by an angle-resolved high resolution analyzer Sakai D, Oshima C, Ohta T, Koshida N |
1787 - 1793 |
Deposition of NiOx thin films with radio frequency magnetron sputtering and their characteristics as a source/drain electrode for the pentacene thin film transistor Yun DJ, Rhee SW |
1794 - 1799 |
Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications Kettle J, Hoyle RT, Perks RM, Dimov S |
1800 - 1807 |
Deposition of WNxCy for diffusion barrier application using the imido guanidinato complex W((NPr)-Pr-i)Cl-3[(PrNC)-Pr-i(NMe2)(NPr)-Pr-i] Ajmera HM, Heitsch AT, Anderson TJ, Wilder CB, Reitfort LL, McElwee-White L, Norton DP |
1808 - 1812 |
Transferring optical proximity correction effects into a process model Li JL, Yan QL, Melvin LS |
1813 - 1816 |
Use of ion beam assisted deposition and low temperature annealing for the fabrication of low loss, vertically stacked alumina waveguide structures Nightingale JR, Goswami R, Duperre J, Dawson JM, Hornak LA, Korakakis D |
1817 - 1820 |
Nonvolatile memory and antifuse behavior in Pt/a-TiO2/Ag structures Busani T, Devine RAB |
1821 - 1823 |
Electron-beam lithography of multiple-layer submicrometer periodic arrays on a barium fluoride substrate Tharp JS, Shelton DJ, Wadsworth SL, Boreman GD |