화학공학소재연구정보센터

Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.26, No.5 Entire volume, number list
ISSN: 1071-1023 (Print) 

In this Issue (35 articles)

L41 - L44 Study of substrate-directed ordering of long double-stranded DNA molecules on bare highly oriented pyrolytic graphite surface based on atomic force microscopy relocation imaging
Wang HB, An HJ, Zhang F, Zhang ZX, Ye M, Xiu P, Zhang Y, Hu J
1637 - 1646 Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation
Sumiya M, Bruce R, Engelmann S, Weilnboeck F, Oehrlein GS
1647 - 1653 Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation
Sumiya M, Bruce R, Engelmann S, Weilnboeck F, Oehrlein GS
1654 - 1659 Comparative study of thermally cured and electron-beam-exposed hydrogen silsesquioxane resists
Choi S, Word MJ, Kumar V, Adesida I
1660 - 1665 Nanofabrication by mechanical and electrical processes using electrically conductive diamond tip
Miyake S, Zheng HF, Kim J, Wang M
1666 - 1669 Sub-50-nm track pitch mold using electron beam lithography for discrete track recording media
Sbiaa R, Tan EL, Seoh RM, Aung KO, Wong SK, Piramanayagam SN
1670 - 1674 Oxidation behavior of In95Sn5 solid solution
Ramasamy S, Sabarinathan V, Agarwal N, Smith DJ
1675 - 1683 Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Carlstrom CF, van der Heijden R, Andriesse MSP, Karouta F, van der Heijden RW, van der Drift E, Salemink HWM
1684 - 1689 Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography
Ting YH, Park SM, Liu CC, Liu XS, Himpsel FJ, Nealey PF, Wendt AE
1690 - 1695 Fabrication of concave gratings by curved surface UV-nanoimprint lithography
Chen YP, Lee YP, Chang JH, Wang LA
1696 - 1699 Growth of nitrogen doped ZnO films through a nitrogen diffusion process from WN films formed by a cosputtering technique
Lee J, Ha J, Hong J, Cha S, Paik U
1700 - 1704 Field-emission fluorescent lamp using carbon nanotubes on a wire-type cold cathode and a reflecting anode
Huang JX, Chen J, Deng SZ, She JC, Xu NS
1705 - 1711 Fabrication and properties of Cu-Ni mixed-metal periodical array for midinfrared filtering and hydrophobic application
Huang WH, Yang YL, Wu SC
1712 - 1717 Correlation of the growth rate for selective epitaxial growth of silicon and oxide thickness and oxide coverage in a reduced pressure chemical vapor deposition pancake reactor
Lee KY
1718 - 1722 Optical properties and critical-point energies of BaTiO3 (001) from 1.5 to 5.2 eV
Choi SG, Dattelbaum AM, Picraux ST, Srivastava SK, Palmstrom CJ
1723 - 1727 Comparative study of ZrN and Zr-Ge-N thin films as diffusion barriers for Cu metallization on Si
Leu LC, Sadik P, Norton DP, McElwee-White L, Anderson TJ
1728 - 1731 Nanochannels fabricated in polydimethylsiloxane using sacrificial electrospun polyethylene oxide nanofibers
Bellan LM, Strychalski EA, Craighead HG
1732 - 1739 Programmable proximity aperture lithography with MeV ion beams
Puttaraksa N, Gorelick S, Sajavaara T, Laitinen M, Singkarat S, Whitlow HJ
1740 - 1744 Comparison of selective Ge growth in SiO2 trenches on Si(001) and on blanket Si(001) substrates: Surface roughness and doping
Park JS, Curtin M, Hydrick JM, Carroll M, Fiorenza JG, Lochtefeld A, Novak S
1745 - 1747 Large areas of periodic nanoholes perforated in multistacked films produced by lift-off
Wu W, Dey D, Katsnelson A, Memis OG, Mohseni H
1748 - 1752 Self-aligned metal-contact and passivation technique for submicron ridge waveguide laser fabrication
Teng JH, Lim EL, Chua SJ, Ang SS, Chong LF, Dong JR, Yin R
1753 - 1756 Iterative imprint for multilayered nanostructures by feeding, vacuum forming, and bonding of sheets
Suzuki H, Nagato K, Sugimoto S, Tsuchiya K, Hamaguchi T, Nakao M
1757 - 1760 Electron field emission from ZnOx nanoparticles decorated on vertically aligned carbon nanotubes prepared by vapor-phase transport
Wisitsoraat A, Tuantranont A, Patthanasettakul V, Mongpraneet S
1761 - 1764 Fabrication of gold tips suitable for tip-enhanced Raman spectroscopy
Williams C, Roy D
1765 - 1770 Effect of ZnO catalyst on carbon nanotube growth by thermal chemical vapor deposition
Lee SF, Chang YP, Lee LY
1771 - 1774 Single-pass forming for three-dimensional microstructures by high-speed shearing of multilayer thin films
Hamaguchi T, Yonemoto H, Nagato K, Tsuchiya K, Nakao M
1775 - 1781 ArF resist-friendly etching technology
Hayashi T, Morikawa Y, Suu K, Ishikawa M
1782 - 1786 Specific spectral features in electron emission from nanocrystalline silicon quasi-ballistic cold cathode detected by an angle-resolved high resolution analyzer
Sakai D, Oshima C, Ohta T, Koshida N
1787 - 1793 Deposition of NiOx thin films with radio frequency magnetron sputtering and their characteristics as a source/drain electrode for the pentacene thin film transistor
Yun DJ, Rhee SW
1794 - 1799 Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications
Kettle J, Hoyle RT, Perks RM, Dimov S
1800 - 1807 Deposition of WNxCy for diffusion barrier application using the imido guanidinato complex W((NPr)-Pr-i)Cl-3[(PrNC)-Pr-i(NMe2)(NPr)-Pr-i]
Ajmera HM, Heitsch AT, Anderson TJ, Wilder CB, Reitfort LL, McElwee-White L, Norton DP
1808 - 1812 Transferring optical proximity correction effects into a process model
Li JL, Yan QL, Melvin LS
1813 - 1816 Use of ion beam assisted deposition and low temperature annealing for the fabrication of low loss, vertically stacked alumina waveguide structures
Nightingale JR, Goswami R, Duperre J, Dawson JM, Hornak LA, Korakakis D
1817 - 1820 Nonvolatile memory and antifuse behavior in Pt/a-TiO2/Ag structures
Busani T, Devine RAB
1821 - 1823 Electron-beam lithography of multiple-layer submicrometer periodic arrays on a barium fluoride substrate
Tharp JS, Shelton DJ, Wadsworth SL, Boreman GD