1 - 5 |
Optical properties of photochromic organic-inorganic composites Mo YG, Dillon RO, Snyder PG, Tiwald TE |
6 - 11 |
Structural and optical properties of titanium oxide thin films deposited by filtered arc deposition Bendavid A, Martin PJ, Jamting A, Takikawa H |
12 - 16 |
Composition dependent structural properties of Pb1-xEuxSe thin films Sharma PC |
17 - 25 |
The development and testing of emissivity enhancement coatings for themophotovoltaic (TPV) radiator applications Cockeram BV, Measures DP, Mueller AJ |
26 - 34 |
Infrared emittance modulation devices using electrochromic crystalline tungsten oxide, polymer conductor, and nickel oxide Trimble C, DeVries M, Hale JS, Thompson DW, Tiwald TE, Woollam JA |
35 - 40 |
Stability and sensing mechanism of high sensitivity chlorine gas sensors using transparent conducting oxide thin films Miyata T, Minami T |
41 - 48 |
In situ spectroscopic ellipsometry as a surface-sensitive tool to probe thin film growth Liu C, Erdmann J, Macrander A |
49 - 54 |
Modeling the functional performance of plasma polymerized thin films Moser EM, Faller C, Pietrzko S, Eggimann F |
55 - 59 |
The structural, optical and secondary electron emission properties of MgO and Mg-O-Cs thin films prepared by ion beam assisted deposition Rho SJ, Jeong SM, Baik HK, Song KM |
60 - 63 |
Unique Brewster-angle window transparent to both polarizations Surdutovich GI, Vitlina RZ, Baranauskas V |
64 - 72 |
Sputtering and chemical erosion during CNx synthesis by ion beam assisted filtered cathodic are evaporation Spaeth C, Kreissig U, Richter F |
73 - 78 |
Low-energy plasma beam deposition of carbon nitride layers with beta-C3N4-like fractions Weber FR, Oechsner H |
79 - 84 |
Investigation of the valence band states of reactively sputtered carbon nitride films Monclus MA, Cameron DC, Chowdhury AKMS, Barkley R, Collins M |
85 - 88 |
Effect of substrate bias on the bonding structure of carbon nitride thin films Chowdhury AKMS, Cameron DC, Monclus MA |
89 - 95 |
Synthesis and characterization of c-BN films prepared by ion beam assisted deposition and triode sputtering el Mekki MB, Djouadi MA, Mortet V, Guiot E, Nouet C, Mestres N |
96 - 104 |
The mechanism of cubic boron nitride deposition in hydrogen plasmas Konyashin I, Aldinger F, Babaev V, Khvostov V, Guseva M, Bregadze A, Baumgartner KM, Rauchle E |
XI - XI |
Proceedings of the 26th International Conference on Metallurgic Coatings and Thin Films, San Diego, California, April 12-15, 1999 - Preface Matthews A, Ensinger W, Givens JH, Rohde SL |
105 - 111 |
Characterization of pulsed laser deposited h-BN films and h-BN/c-BN layer systems Reisse G, Weissmantel S |
112 - 116 |
Crystalline SiCN: a hard material rivals to cubic BN Chen LC, Chen KH, Wei SL, Kichambare PD, Wu JJ, Lu TR, Kuo CT |
117 - 121 |
Deposition of carbon nitride films by ionised magnetron sputtering Kusano Y, Christou C, Barber ZH, Evetts JE, Hutchings IM |
122 - 126 |
Combustion flame synthesis: a promising technique to obtain diamond single crystal Le Huu T, Schmitt M, Paulmier D |
127 - 133 |
Formation of intermetallic cobalt phases in the near surface region of cemented carbides for improved diamond layer deposition Cremer R, Mertens R, Neuschutz D, Lemmer O, Frank M, Leyendecker T |
134 - 138 |
An investigation of the structural properties of diamond films deposited by pulsed bias enhanced hot filament CVD Hassan IU, Rego CA, Ali N, Ahmed W, O'Hare IP |
139 - 145 |
Effect of early methane introduction on the properties of nano-seeded MPCVD-diamond films Shaik AA, Khan MA, Naseem HA, Brown WD |
146 - 150 |
High rate deposition of diamond-like carbon films by magnetically enhanced plasma CVD Sun Z, Shi X, Liu E |
151 - 156 |
The structural and electron field emission characteristics of pulsed laser deposited diamond-like carbon films with thermal treatment Jung HS, Park HH, Pang SS, Lee SY |
157 - 161 |
Nitrogenated diamond produced by introducing ammonia into the gas feed in hot-filament CVD Baranauskas V, Durrant SF, Tosin MC, Peterlevitz AC, Li BB, Castro SG |
162 - 166 |
Role of surface pre-treatment in the CVD of diamond films on copper Ali N, Fan QH, Ahmed W, Hassan IU, Rego CA, O' Hare IP |
167 - 173 |
Optical and tribological properties of diamond-like carbon films synthesized by plasma immersion ion processing He XM, Walter KC, Nastasi M, Lee ST, Sun XS |
174 - 178 |
Investigation of tungsten incorporated amorphous carbon film Rusli, Yoon SF, Yang H, Ahn J, Huang QF, Zhang Q, Guo YP, Yang CY, Teo EJ, Wee ATS, Huan ACH |
179 - 183 |
Growth of polycrystalline SiC films on SiO2 and Si3N4 by APCVD Wu CH, Zorman CA, Mehregany M |
184 - 188 |
Nitrogenation of diamond by glow discharge plasma treatment Durrant SF, Baranauskas V, Peterlevitz A, Li BB, Tosin MC, Rangel EC, Wang J, Castro SG, de Moraes MAB |
189 - 193 |
Electrical and optical properties of diamond-like carbon Grill A |
194 - 198 |
Large area deposition of field emission cathodes for flat panel displays Jankowski A, Hayes J, Morse J, Ferreira J |
199 - 204 |
Field emission characteristics of cesiated amorphous carbon films by negative carbon ion Han DW, Kim YH, Choi DJ, Chi EJ, Yoon WY, Baik HK |
205 - 209 |
Wide band gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition Chen KH, Wu JJ, Wen CY, Chen LC, Fan CW, Kuo PF, Chen YF, Huang YS |
210 - 213 |
Effect of ion bombardment on the properties of B4C thin films deposited by RF sputtering Lousa A, Martinez E, Esteve J, Pascual E |
214 - 218 |
Improvement of the corrosion resistance of C/Al-composites by diamond-like carbon coatings Dorner A, Wielage B, Schurer C |
219 - 222 |
CNx thin films grown by pulsed laser deposition: Raman, infrared and X-ray photoelectron spectroscopy study Trusso S, Vasi C, Neri F |
223 - 228 |
Field emission characteristic of diamond films grown by electron assisted chemical vapor deposition Shim JY, Chi EJ, Baik HK, Song KM |
229 - 232 |
Characterization of interface of c-BN film deposited on silicon(100) substrate Tian JZ, Xia LF, Ma XX, Sun Y, Byon ES, Lee SH, Lee SR |
233 - 238 |
Structure and properties of diamond films deposited on porous silicon Baranauskas V, Li BB, Peterlevitz AC, Tosin MC, Durrant SF |
239 - 245 |
The effects of substrates on carbon nitride thin films prepared by direct dual ion beam deposition Lee DY, Kim YH, Kim IK, Baik HK |
246 - 251 |
Characterization of hydrogen-free diamond-like carbon films deposited by pulsed plasma technology Wang DY, Chang CL, Ho WY |
252 - 255 |
An array of inductively coupled plasma sources for large area plasma Park SG, Kim C, O BH |
256 - 262 |
Characterization of ion-assisted pulsed laser deposited cubic boron nitride films Weissmantel S, Reisse G |
263 - 269 |
Determination of coating mechanical properties using spherical indenters Tang KC, Arnell RD |
270 - 276 |
Internal stresses, Young's modulus and practical adhesion of organic coatings applied onto 5754 aluminium alloy Bouchet J, Roche AA, Hamelin P |
277 - 283 |
Critical loads and effective frictional force measurements in the industrial scratch testing of TiN on M2 tool steel Dyrda K, Sayer M |
284 - 289 |
New possibilities of mechanical surface characterization with spherical indenters by comparison of experimental and theoretical results Chudoba T, Schwarzer N, Richter F |
290 - 294 |
Micromechanical characterisation of plasma treated polymer surfaces Dahl S, Rats D, von Stebut J, Martinu L, Klemberg-Sapieha JE |
295 - 302 |
Thermally-actuated cantilever beam for achieving large in-plane mechanical deflections Kolesar ES, Allen PB, Howard JT, Wilken JM, Boydston N |
303 - 310 |
Finite-element modeling of the stresses and fracture during the indentation of hard elastic films on elastic-plastic aluminum substrates Souza RM, Mustoe GGW, Moore JJ |
311 - 315 |
Finite element simulation of the development of residual stress in IAPVD films Ward DJ, Williams AF |
316 - 321 |
Stress and oxidation in CuNi thin films Bruckner W, Baunack S |
322 - 329 |
The concept of an advanced impact tester supported by evaluation software for the fatigue strength characterization of hard layered media Bouzakis KD, Vidakis N, David K |
330 - 336 |
Evaluation of fracture toughness of ultra-thin amorphous carbon coatings deposited by different deposition techniques Li XD, Bhushan B |
337 - 342 |
Effects of temperature on the multiple cracking progress of sub-micron thick glass films deposited on a polymer substrate Yanaka M, Kato Y, Tsukahara Y, Takeda N |
343 - 346 |
In situ analysis of aluminum enhanced crystallization of hydrogenated amorphous silicon (a-Si : H) using X-ray diffraction Khalifa FA, Naseem HA, Shultz JL, Brown WD |
347 - 352 |
High frequency scanning acoustic microscopy: a novel non-destructive surface analytical tool for assessment of coating-specific elastic moduli and tomographic study of subsurface defects Rats D, von Stebut J, Augereau F |
353 - 356 |
Substrate induced DLC film thickness variations Xu WL, Huang LJ, Shih YZ, Kim T, Hung Y, Li G |
357 - 362 |
Comparative study of thin film physical properties for TiNx deposited by DC magnetron sputtering under temperatures less than 100 degrees C on monocrystalline silicon and polycrystalline iron substrates Roquiny P, Poulet A, Leys Y, Descamps JC, Bodart F, VandenBrande P |
363 - 366 |
Characterization of SiOxNy anti-reflective coatings using SIMS and RBS/HFS Saleh AA, Rothman JB, Kirchhoff JF, Yota J, Nguyen C |
367 - 373 |
The effect of PVD layer constitution on surface free energy Lugscheider E, Bobzin K, Moller M |
374 - 379 |
XPS analyses of TiN films on Cu substrates after annealing in the controlled atmosphere Lu FH, Chen HY |
380 - 384 |
Structural analysis of (Ti1-xAlx)N graded coatings deposited by reactive magnetron sputtering Pinkas M, Pelleg J, Dariel MP |
385 - 389 |
High resolution thickness and interface roughness characterization in multilayer thin films by grazing incidence X-ray reflectivity Kojima I, Li BQ, Fujimoto T |
390 - 394 |
Original and sputtering induced interface roughness in AES sputter depth profiling of SiO2/Ta2O5 multilayers Rar A, Kojima I, Moon DW, Hofmann S |
395 - 400 |
Investigation of plasma-deposited ITO films by GIXR and GIXRD Wulff H, Quaas M, Steffen H |
401 - 405 |
Characterization and properties of diamond-like carbon films for magnetic recording application Gopinathan N, Robinson C, Ryan F |
406 - 411 |
Plasma chemical vapor deposition of thin carbon nitride films utilizing transport reactions Popov C, Plass MF, Kassing R, Kulisch W |
412 - 416 |
Effects of nitrogen ion implantation on the formation of nickel silicide contacts on shallow junctions Cheng LW, Cheng SL, Chen JY, Chen LJ, Tsui BY |
417 - 422 |
Deposition of silicon carbon nitride films by ion beam sputtering Wu JJ, Wu CT, Liao YC, Lu TR, Chen LC, Chen KH, Hwa LG, Kuo CT, Ling KJ |
423 - 429 |
Investigation on the surface characteristics of GaAs after sulfuric-vapor treatment Kim JW, Kang MG, Park HH |
430 - 434 |
Stress and surface studies of SILAR grown CdS thin films on GaAs(100) Tamulevicius S, Valkonen MP, Laukaitis G, Lindroos S, Leskela M |
435 - 439 |
Bonding and structural changes of natively oxidized GaAs surface during ion induced deposition of Au Kang MG, Park HH |
440 - 445 |
Effect of processing parameters on the microstructure and mechanical properties of TiN film on stainless steel by HCD ion plating Huang JH, Tsai YP, Yu GP |
446 - 450 |
Simple reflectometric method for measurement of weakly absorbing films Surdutovich GI, Vitlina RZ, Baranauskas V |
451 - 455 |
The novel precleaning treatment for selective tungsten chemical vapor deposition Chang TC, Mor YS, Liu PT, Sze SM, Yang YL, Tsai MS, Chang CY |
456 - 460 |
Electrical conduction processes in silicon nitride thin films prepared by r.f. magnetron sputtering using nitrogen gas Awan SA, Gould RD, Gravano S |
461 - 464 |
Characterization of YBCO superconducting films fabricated by pulsed laser deposition Kim SM, Lee SY |
465 - 471 |
Microstructure of CrN coatings produced by PVD techniques Cunha L, Andritschky M, Pischow K, Wang Z |
472 - 479 |
Effect of thermal history on the microhardness of electroless Ni-P Staia MH, Puchi ES, Castro G, Ramirez FO, Lewis DB |
480 - 486 |
Fatigue properties of an AISI 1045 steel coated with an electroless Ni-P deposit Contreras G, Fajardo C, Berrios JA, Pertuz A, Chitty J, Hintermann H, Puchi ES |
487 - 493 |
Fatigue behavior of a quenched and tempered AISI 4340 steel coated with an electroless Ni-P deposit Garces Y, Sanchez H, Berrios J, Pertuz A, Chitty J, Hintermann H, Puchi ES |
494 - 499 |
Investigation of oxidation process on plasma treated thin Al-films by GIXR and GIXRD Quade A, Wulff H |
500 - 505 |
A microstructural study of transparent metal oxide gas barrier films Henry BM, Dinelli F, Zhao KY, Grovenor CRM, Kolosov OV, Briggs GAD, Roberts AP, Kumar RS, Howson RP |
506 - 512 |
Observation of a decagonal quasicrystalline phase and quasicrystalline approximants in in situ heated thin films of the Al-Co-Cr-Fe-O system Reyes-Gasga J, Pita-Larranaga A, Valles-Gonzalez MP, Sanchez-Pascual A |
513 - 517 |
Interesting optical properties of films composed of very small grains formed from a high-rate nanoparticle beam Urban FK, Hosseini-Tehrani A, Khabari A, Griffiths P, Fernandez G |
518 - 524 |
SiC MEMS: opportunities and challenges for applications in harsh environments Mehregany M, Zorman CA |
525 - 530 |
Crystallization and ferroelectric behavior of sputter deposited PZT using a target containing excess Pb and O contents Ha SM, Kim DH, Park HH, Kim TS |
531 - 535 |
The effects of cation-substitution on the ferroelectric properties of sol-gel derived PZT thin film for FRAM application Kim WS, Ha SM, Park HH, Kim CE |
536 - 541 |
Growth of organic thin films by the matrix assisted pulsed laser evaporation (MAPLE) technique Pique A, McGill RA, Chrisey DB, Leonhardt D, Mslna TE, Spargo BJ, Callahan JH, Vachet RW, Chung R, Bucaro MA |