1 - 3 |
Thin SiO2 Growth by Combined Rapid Thermal and Plasma Processing Boumaiza N, Achour S, Tayar ME |
4 - 11 |
Investigation of the Process Factor Space on Bias-Enhanced Nucleation of Diamond on Silicon Wolter SD, Glass JT, Stoner BR |
12 - 17 |
Conductivity of Boron-Implanted Polycrystalline Thin Silicon Films Mansour F, Bouchemat M, Boukezzata M, Touidjen NH, Bielledaspet D, Mirouh K |
18 - 24 |
Rapid Thermal Processed Thin-Films of Niobium Pentoxide (Nb2O5) Deposited by Reactive Magnetron Sputtering Pignolet A, Rao GM, Krupanidhi SB |
25 - 30 |
Investigation of the Titanium Silicide Formation in Plasma Activated Physical Vapor-Deposition Wulff H, Klimke J, Steffen H, Eggs C |
31 - 36 |
Characterization of Thin Solid Films of Rare-Earth-Oxides Formed by the Metalloorganic Chemical-Vapor-Deposition Technique, for High-Temperature Corrosion Applications Bonnet G, Lachkar M, Colson JC, Larpin JP |
37 - 43 |
Variable-Angle Spectroscopic Ellipsometry for Deep UV Characterization of Dielectric Coatings Zuber A, Kaiser N, Stehle JL |
44 - 51 |
Electrodeposition of Zn-1-X Cd-X Se (X=0-1) Thin-Films Natarajan C, Nogami G, Sharon M |
52 - 58 |
Crystallinity, Morphology and Microstructure of Chemical-Vapor-Deposited Carbon-Films on Different Substrates Johansson AS, Carlsson JO |
59 - 63 |
Porous SiO2-Films Analyzed by Transmission Electron-Microscopy Gignac LM, Parrill TM, Chandrashekhar GV |
64 - 69 |
Structure of Epitaxial Delta-NbN Films Deposited by Cathode Reactive Sputtering Shalaeva EV, Baryshev RS, Kuznetsov MV, Mitrofanov BV |
70 - 75 |
Atomic-Force Microscopy on Cross-Sections of Optical Coatings - A New Method Duparre A, Ruppe C, Pischow KA, Adamik M, Barna PB |
76 - 82 |
Stoichiometry of Tantalum Oxide-Films Prepared by KrF Excimer Laser-Induced Chemical-Vapor-Deposition Imai Y, Watanabe A, Mukaida M, Osato K, Tsunoda T, Kameyama T, Fukuda K |
83 - 86 |
Grain-Size and Recrystallization of Tin, Zrn, NbN, and Crn Alloyed and Multilayer Films Andrievski RA, Anisimova IA, Anisimov VP, Makarov VP, Popova VP |
87 - 89 |
Growth and Some Properties of in-Xga-1-Xn Thin-Films by Reactive Evaporation Sato Y, Sato S |
90 - 97 |
Mechanical-Stress and Electrical-Resistance of CrSi-O Thin-Films Bruckner W, Sobe G, Griessmann H, Baunack S, Reiss G |
98 - 106 |
Preparation, Structure, Composition, Optical and Photoelectrochemical Properties of Vacuum Annealed in-Se Thin-Films Sahu SN |
107 - 114 |
Xepitaxial-Growth and Thermal-Stability of Thin Pd2Si Films on (001)Si, (011)Si and (111)Si Chen JF, Chen LJ |
115 - 119 |
Preparation of Compositionally Gradient Ti-Tin Films by RF Reactive Sputtering Inoue S, Ucihda H, Takeshita K, Koterasawa K, Howson RP |
120 - 123 |
Preparation and Physical-Properties of Tmt-TTF-C60Br6 Langmuir-Blodgett-Film Xiao YF, Ye YH, Yao ZQ |
124 - 131 |
Preparation of Textured and Photoactive 2H-Ws2 Thin-Films by Sulfurization of WO3 Ennaoui A, Fiechter S, Ellmer K, Scheer R, Diesner K |
132 - 138 |
Optical and Thermal Characterization of Coatings Roger JP, Gleyzes P, Elrhaleb H, Fournier D, Boccara AC |
139 - 147 |
Growth-Morphology and Misfit Relaxation of MBE-Grown in(0.6)G(0.4)as on GaAs(001) Tillmann K, Gerthsen D, Forster A, Urban K |
148 - 153 |
Influence of Sputtering Pressure on the Microstructure Evolution of AIN Thin-Films Prepared by Reactive Sputtering Lee HC, Kim GH, Hong SK, Lee KY, Yong YJ, Chun CH, Lee JY |
154 - 159 |
Effect of Laser Repetition Rate on the Melting and Ablation of Ni24Zr76 Alloy Ribbon Luby S, Majkova E, Illekova E, Sandrik R, Danna E, Luches A, Perrone A, Enzo S |
160 - 167 |
Growth-Mechanism and Structure of Electrodeposited Cu/Ni Multilayers Wang L, Fricoteaux P, Yuzhang K, Troyon M, Bonhomme P, Douglade J, Metrot A |
168 - 172 |
Electric Subband Studies at an AlGaAs/GaAs Heterointerface by Photoluminescence Kim DY, Kang TW, Kim TW |
173 - 182 |
Kinetic-Model of Vapor-Deposited Thin-Film Condensation - Stage of Liquid-Like Coalescence Osipov AV |
183 - 185 |
Pulsed-Laser-Induced Synthesis of Nickel Sulfides in Sulfur-Containing Liquids Anischik VM, Markevich MI, Piskunov FA |
186 - 191 |
Carbon Depth Distribution in Spin-on Silicon Dioxide Films Gaponenko NV, Gnaser H, Becker P |
192 - 201 |
Annealing Effects on A-SiC-H and A-SiC-H(F) Thin-Films Deposited by PECVD at Room-Temperature Kim DS, Lee YH |
202 - 208 |
Corrosion Behavior in Acid-Solution of (Ti, Cr)N-X Films Deposited on Glass Massiani Y, Gravier P, Fedrizzi L, Marchetti F |
209 - 218 |
Surface Modification in Nitrogen and Boron-Ion Implanted P18 High-Speed Steel with Tin Coating Dimitrova VI |
219 - 227 |
Nanoindentation of Amorphous Aluminum-Oxide Films .1. The Influence of the Substrate on the Plastic Properties Chechenin NG, Bottiger J, Krog JP |
228 - 235 |
Nanoindentation of Amorphous Aluminum-Oxide Films .2. Critical Parameters for the Breakthrough and a Membrane Effect in Thin Hard Films on Soft Substrates Chechenin NG, Bottiger J, Krog JP |
236 - 240 |
Crystallization of Amorphous-Silicon by Nisi2 Precipitates Schoenfeld O, Hempel T, Zhao X, Aoyagi Y |
241 - 247 |
Dispersion of the Electrooptical Response in Poled Polymer-Films Determined by Stark Spectroscopy Heldmann C, Brombacher L, Neher D, Graf M |
248 - 250 |
Optical-Properties of Tm2S3 Thin-Films Gigineishvili AV, Dzhabua ZU, Davitadze KD, Glurdzhidze LN |
251 - 255 |
Growth Mechanisms of Silicon Films Produced by Laser-Induced Chemical-Vapor-Deposition Tamir S, Komem Y, Eizenberg M, Zahavi J |
256 - 262 |
Antireflection Coatings on Kc1 Single-Crystal Windows with Low Optical Loss Atanassov G, Popov D, Gu PF |
263 - 265 |
Photoinduced Phenomena in Spin-Coated Vitreous As2S3 and AsSe Films Shtutina S, Klebanov M, Lyubin V, Rosenwaks S, Volterra V |
266 - 270 |
Effects of Annealing on the Electrical-Conductivity of C-60 Films Gong JL, Zhang FQ, Li YH, Ma GB, Chen GH |
271 - 274 |
Langmuir-Blodgett-Films Made from Yttrium Arachidate Schurr M, Brandl D, Tomaschko C, Schoppmann C, Voit H |
275 - 279 |
Miscibility of Cyanine Dyes in 2-Dimensional Aggregates Bliznyuk V, Mohwald H |
280 - 286 |
Characterization of Long-Periodic Layered Structures by X-Ray-Diffraction .6. Electron-Density Distribution and Chain Orientation in a Langmuir-Blodgett-Film of Cadmium Stearate Sasanuma Y, Nakahara H |
287 - 295 |
Characterization of Behenic Acid Glucose-Oxidase Langmuir-Blodgett-Films by Spectrophotometry - A Tentative Model of Their Organization Fiol C, Alexandre S, Dubreuil N, Valleton JM |
296 - 298 |
Ir Spectroscopic Study of SO2, Adsorption on Polysiloxane Layers Containing Tertiary Amino-Groups Vasiljeva LL, Dultsev FN, Milekhin AH |
299 - 306 |
Morphologic and Spectroscopic Characterization of Porous Pt/GaAs Schottky Diodes by Scanning-Tunneling-Microscopy Maso J, Barniol N, Perezmurano F, Aymerich X |
307 - 310 |
Deposition of Thin Polycrystalline Films of Cuprous Thiocyanate on Conducting Glass and Photoelectrochemical Dye-Sensitization Tennakone K, Kumarasinghe AR, Sirimanne PM, Kumara GR |
311 - 316 |
Spectral Response of Monoclinic and Triclinic Lead Phthalocyanine to Nitrogen-Dioxide Campbell D, Collins RA |
317 - 321 |
Growth and Characterization of 3C-SiC Films on Si Substrates by Reactive Magnetron Sputtering - Effects of CH4 Partial-Pressure on the Crystalline Quality, Structure and Stoichiometry Wahab Q, Hultman L, Ivanov IP, Willander M, Sundgren JE |
322 - 327 |
Optical-Absorption Behavior of Evaporated Znin2Se4 Thin-Films Hendia TA, Soliman LI |
328 - 333 |
Influence of Composition and Heat-Treatment on the Structure of Se-Te Films Elkorashy A, Elzahed H, Radwan M, Abdalla AM |
334 - 339 |
Photoresponse of Polycrystalline ZnO Films Deposited by RF Bias Sputtering Zhang DH, Brodie DE |
341 - 341 |
Mixed-Stack Charge-Transfer Films Prepared by Langmuir-Blodgett Technique and Donor Doping (Vol 254, Pg 240, 1995) Nichogi K, Taomoto A, Nambu T, Murakami M |
343 - 344 |
Determination of Optical-Constants of Molecular Films Assembled via Alternate Polyion Adsorption (Vol 254, Pg 246, 1995) Ramsden JJ, Lvov YM, Decher G |