Thin Solid Films

Thin Solid Films, Vol.302, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (42 articles)

1 - 4	Thickness Dependent Properties of Chemically Deposited Bi2S3 Thin-Films Lokhande CD, Ubale AU, Patil PS
5 - 11	Thin-Film Characterization of Diamond-Like Carbon-Films Prepared by RF Plasma Chemical-Vapor-Deposition Hirakuri KK, Minorikawa T, Friedbacher G, Grasserbauer M
12 - 16	Chemical Bath Deposition of Cubic Copper(I) Selenide and Its Room-Temperature Transformation to the Orthorhombic Phase Levyclement C, Neumannspallart M, Haram SK, Santhanam KS
17 - 24	The Influence of Hydrogen Dilution Ratio on the Crystallization of Hydrogenated Amorphous-Silicon Films Prepared by Plasma-Enhanced Chemical-Vapor-Deposition Kim HY, Lee KY, Lee JY
25 - 30	Effect of Process Parameters on the Characteristics of Indium Tin Oxide Thin-Film for Flat-Panel Display Application Lee BH, Kim IG, Cho SW, Lee SH
31 - 42	Charge-Transfer Reactions Yielding Conductive Radical-Ion Salt Films of Dicyanoquinonediimine Edelmann A, Wachtel H
43 - 50	Incoherent Superposition in Ellipsometric Measurements Forcht K, Gombert A, Joerger R, Kohl M
51 - 53	Characterization of Porous Silicon by Means of Photoacoustic-Spectroscopy Ohmukai M, Tsutsumi Y
54 - 57	Indirect Transitions Caused by Electron-Dislocation Interaction in Size-Quantized Semiconductor Film Kazaryan EM, Mkhoyan KA, Sarkisyan HA
58 - 65	Carbon Nitride Cnx Film Deposition Assisted by Ir Laser-Ablation in a Cold Remote Nitrogen Plasma Jama C, Rousseau V, Dessaux O, Goudmand P
66 - 70	Electrochromism and Photochromism in Amorphous Molybdenum Oxide-Films Scarminio J, Lourenco A, Gorenstein A
71 - 76	Electrodeposition and Optical Characterization of CdS Thin-Films on Ito-Coated Glass Sasikala G, Dhanasekaran R, Subramanian C
77 - 83	Titanium Thin-Film Deposition in a Deuterium Atmosphere Checchetto R
84 - 88	Deposition of WO3 Thin-Films by the Sol-Gel Method Lee KD
89 - 97	Effect of Annealing on Physical-Properties of Conducting Poly(Ortho-Anisidine) Langmuir-Blodgett-Films Ram MK, Carrara S, Paddeu S, Nicolini C
98 - 101	Palladium Membranes Supported on Porous Ceramics Prepared by Chemical-Vapor-Deposition Huang L, Chen CS, He ZD, Peng DK, Meng GY
102 - 107	Raman-Scattering Studies of Amorphous Sixge1-X-H Alloy-Films Produced by Hot-Filament Assisted Chemical-Vapor-Deposition Technique Kumbhar AA, Kshirsagar ST
108 - 110	Formation of Ti Amorphous Films Deposited on Liquid Nitrogen-Cooled Substrates by Ion-Beam Sputtering Yu RC, Wang WK
111 - 115	A Surface and Interface Study on the InSb/GaAs Heterostructures Li K, Wee AT, Lin J, Lee KK, Watt F, Tan KL, Feng ZC, Webb JB
116 - 121	Characteristics of ZnO Thin-Films Deposited Onto Al/Si Substrates by RF Magnetron Sputtering Yoon KH, Choi JW, Lee DH
122 - 126	Ultrasonic Micromachining on Al Thin-Film Using Atomic-Force Microscopy Combined Quartz-Crystal Resonator Iwata F, Kawaguchi M, Aoyama H, Sasaki A
127 - 132	Morphology of TiSi2 Films on Si Formed from Co-Deposited Ti and Si Herner SB, Krishnamoorthy V, Naman A, Jones KS, Gossmann HJ, Tung RT
133 - 139	Structural-Changes in ZnO/NiO Artificial Superlattices Made by Ion-Beam Sputtering Nishizawa S, Tsurumi T, Hyodo H, Ishibashi Y, Ohashi N, Yamane M, Fukunaga O
140 - 146	CVD Synthesis and SNMS Characterization of Thin-Films of ABO(3) Perovskite-Type Materials (PbTiO3, La(Sr)Coo3, La(Sr)Mno3, LaNiO3) Rebane JA, Gorbenko OY, Suslov SG, Yakovlev NV, Korsakov IE, Amelichev VA, Tretyakov YD
147 - 154	An X-Ray-Diffraction Study of Epitaxial Tin/NbN Superlattices Madan A, Yashar P, Shinn M, Barnett SA
155 - 161	Temperature-Dependence of Lead Loss in RF Magnetron Sputtering of a Stoichiometric Pb(Zr,Ti)O-3 Target Basit NA, Kim HK, Blachere J
162 - 168	Studies of Na-Irradiated Ni/Si Bilayers - Na Migration and NiSi Formation Lieb KP, Haussalo P, Bolse W, Illgner C, Keinonen J, Niederdrenk M
169 - 178	Room-Temperature Wafer Surface Cleaning by in-Situ ECR (Electron-Cyclotron-Resonance) Hydrogen Plasma for Silicon Homoepitaxial Growth Kim HW, Zhou ZH, Reif R
179 - 192	Ion-Assisted Growth of Ti1-Xalxn/Ti1-Ynbyn Multilayers by Combined Cathodic-Arc/Magnetron-Sputter Deposition Petrov I, Losbichler P, Bergstrom D, Greene JE, Munz WD, Hurkmans T, Trinh T
193 - 200	The Tribological Characteristics of Titanium Nitride, Titanium Carbonitride and Titanium Carbide Coatings Guu YY, Lin JF, Ai CF
201 - 203	Energy-Band Offsets of Sigec Heterojunctions Kolodzey J, Chen F, Orner BA, Guerin D, Shah SI
204 - 213	Optical-Properties of SnO2 Thin-Films Grown by Atmospheric-Pressure Chemical-Vapor-Deposition Oxidizing Sncl4 Davazoglou D
214 - 222	Analysis of Light-Emitting-Diodes by X-Ray Reflectivity Measurements Christ T, Geffart F, Glusen B, Kettner A, Lussem G, Schafer O, Stumpflen V, Wendorff JH, Tsukruk VV
223 - 230	Influence of Several Compounds on the Fluorescence of Rare-Earth Complexes Eu(Tta)(3)Phen and Sm(Tta)(3)Phen in lb Films Zhang RJ, Liu HG, Zhang CR, Yang KZ, Zhu GY, Zhang HW
231 - 234	Electric-Field and Photochemical Effects in D85N Mutant Bacteriorhodopsin Substituted with 4-Keto-Retinal Kolodner P, Lukashev EP, Ching YC, Druzhko AB
235 - 238	Polarization Processes in Anodic Oxide-Films Kosjuk LM, Odynets LL
239 - 249	Strain Fields and Unit-Cell Deformation in High-T-C Superconductor Heterostructures Gusso M, Decaro L, Tapfer L
250 - 255	On the Determination of the Sp(3) to Sp(2) Ratio in Diamond-Like Carbon Thin-Films Mahajan SS, Barshilia HC, Mehta BR, Vankar VD
256 - 259	Enhancement of Electrical-Conductivity in Sulfur-Doped C-60 Films Gong JL, Li YH, Lin SH, Ma GB, Yang YH, Chen GH
260 - 265	Formation of Ultra-Shallow Junctions Using Epitaxial CoSi2 Thin-Film as Diffusion Sources Bae KS, Kim JR, Hong SY, Park YB, Cho YS
266 - 269	Temperature-Induced Dissolution of Cr2O3 into Polycrystalline Tantalum Rothhaar U, Oechsner H
270 - 274	Observation of the Burstein-Moss Shift in Heavily Te-Doped In0.5Ga0.5P Layers Grown by Liquid-Phase Epitaxy Yoon IT, Ji TS, Park HL