Electrochemical and Solid State Letters

Electrochemical and Solid State Letters, Vol.4, No.3 Entire volume, number list

ISSN: 1099-0062 (Print)

In this Issue (14 articles)

E9 - E12	Oxygen reduction on teflon bonded Pt/WO3/C electrode in sulfuric acid Sun Z, Chiu HC, Tseung ACC
H1 - H3	Hydroxyl groups on boron-doped diamond electrodes and their modification with a silane coupling agent Notsu H, Fukazawa T, Tatsuma T, Tryk DA, Fujishima A
L1 - L1	Comment on "Effect of dissolved iron on oxygen reduction at a Pt/C electrode in sulfuric acid" Ye S
L2 - L2	Response to "Comment on'Effect of dissolved iron on oxygen reduction at a Pt/C electrode in sulfuric acid' " Sun Z, Tseung ACC
L3 - L3	LiBOB and its derivatives weakly coordinating anions, and the exceptional conductivity of their nonaqueous solutions (vol 4, pg E1, 2001) Xu W, Angell CA
A19 - A22	Expansion of active site area and improvement of kinetic reversibility in electrochemical pseudocapacitor electrode Lee HY, Kim SW, Lee HY
A23 - A26	Ceria-supported platinum as hydrogen-oxygen recombinant catalyst for sealed lead-acid batteries Hariprakash B, Bera P, Martha SK, Gaffoor SA, Hegde MS, Shukla AK
A27 - A29	Enhancement of reversible hydrogen capacity into activated carbon through water electrolysis Jurewicz K, Frackowiak E, Beguin F
B11 - B13	Enhanced passivation of the oxide/SiGe interface of SiGe epitaxial layers on Si by anodic oxidation Rappich J, Sieber I, Knippelmeyer R
E13 - E15	Mixed electronic-oxide ionic conductor of Fe-doped La(Sr)GaO3 perovskite oxide for oxygen permeating membrane Tsuruta Y, Todaka T, Nisiguchi H, Ishihara T, Takita Y
G23 - G25	Epitaxial growth with monosilane gas on a 400 mm diameter silicon wafer Imai M, Nakahara S, Inoue K, Mayusumi M, Gima S
G26 - G27	Implantation induced selective chemical etching of indium phosphide Simpson TW, Gallivan PA, Mitchell IV
G28 - G30	Investigation of deep submicron single and double gate SOI MOSFETs in accumulation mode for enhanced performance Rauly E, Iniguez B, Flandre D
G31 - G34	Oxygen plasma resistance of low-k organosilica glass films Furusawa T, Ryuzaki D, Yoneyama R, Homma Y, Hinode K