화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Korean Journal of Materials Research, Vol.16, No.4, 264-271, April, 2006
DOI10.3740/MRSK.2006.16.4.264  Export Citation
RF 스퍼터링으로 증착된 하이드록시아파타이트 박막의 ESCA 분석
The ESCA Analysis of Hydroxyapatite Thin Films Deposited by RF Sputtering
정찬회, 이준희†, 김순국, 김명한1, 유재근2, 김승언3
  • 동아대학교 신소재공학과
  • 1충북대학교 재료공학과
  • 2호서대학교 신소재공학
  • 3한국기계연구원
Chan-Hoi Jung, Jun-Hee Lee†, Soon-Kook Kim, Myung-Han Kim1, Jae-Keun Yu2, and Seung-Eon Kim3
  • Dept. of Materials Science and Engineering, Donga University, Korea
  • 1Dept. of Materials Engineering, Chungbuk National University, Korea
  • 2Dept. of Advanced Materials Engineering, Hoseo University, Korea
  • 3Korea Institute Of Machiery and Materials, Korea
E-mail:
RF sputtering process was applied to produce thin hydroxyapatite(HAp) films on Ti-6Al-4V alloy substrates. The effects of different heat treatment conditions on the chemical composites between HAp thin films and Ti-6Al-4V alloy substrates were studied. After deposition, the HAp thin films were heat treated for 1h at 400 ? C,600 ? Cand800 ? C under the atmosphere, and analyzed O/M, FESEM-EDX and ESCA, respectively. Experimental results represented that interface of HAp thin films and Ti-6Al-4V alloy substrates was composed Ti-OH, TiO, TiN, Al 2 O 3 ,V 2 O 3 ,VO 2 . pyrophosphate and decreased carbide followed by the increase of heat treatment temperature.
Keywords:Hydroxyapatite;Ti-6Al-4V Alloy;RF Sputtering;Heat Treatment;ESCA
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