화학공학소재연구정보센터
Journal of Industrial and Engineering Chemistry, Vol.12, No.5, 739-744, September, 2006
Temperature Factor in the Synthesis of Nanostructures on the Surface of Solid by the Molecular Layering Method
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The influence of the preliminary heat treatment temperature (Tt) of alumina and silica, the chemisorption temperature (Tch), and the desorption temperature (Tdes) in the molecular layering process on the chemical structure and phase state of the products of the chemisorption of titanium tetrachloride and the oxichlorides of vanadium and phosphorus are presented in this paper. It is shown that with the increase of Tt, the number of bonds and the concentration of forming element-chloride groups with surface decreases; with the increase of Tch from 200 to 800 ℃, the number of bonds of forming element-chloride groups with surface increases while titanium concentration in chemisoption products decreases. On the surface of silica at Tch below of 350 ℃, the mono-phase structure was formed with adequate anatase modification of TiO2. At Tch ≥ 350 ℃, bi-phase was formed with adequate anatase and rutile. On the surface of alumina, in contrast, a bi-phase structure was formed at low temperature. With the increase of Tch, the part of the anatase form of TiO2 grew, up to 100 % at 600 ℃ .
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