검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
CVD of Zr-Sn-Ti-O thin films by direct injection of solventless liquid precursor mixtures Senzaki Y, Alers GB, Hochberg AK, Roberts DA, Norman JAT, Fleming RM, Krautter H Electrochemical and Solid State Letters, 3(9), 435, 2000 |
| 2 |
Mechanisms of Silicon Dioxide Deposition from the Low-Pressure Chemical-Vapor-Deposition of Diethylsilane Oxygen Mixtures Martin JG, Oneal HE, Ring MA, Roberts DA, Hochberg AK Journal of the Electrochemical Society, 142(11), 3873, 1995 |
| 3 |
Characterization of Thin Copper-Films Grown via Chemical-Vapor-Deposition Using Liquid Coinjection of Trimethylvinylsilane and (Hexafluoroacetylacetonate) Cu (Trimethylvinylsilane) Parmeter JE, Petersen GA, Smith PM, Apblett CA, Reid JS, Norman JA, Hochberg AK, Roberts DA, Omstead TR Journal of Vacuum Science & Technology B, 13(1), 130, 1995 |
| 4 |
Chemical Additives for Improved Copper Chemical-Vapor-Deposition Processing Norman JA, Roberts DA, Hochberg AK, Smith P, Petersen GA, Parmeter JE, Apblett CA, Omstead TR Thin Solid Films, 262(1-2), 46, 1995 |
| 5 |
Cyclic Alkylsilanes as Low-Pressure Chemical-Vapor-Deposition Silicon Dioxide Precursors Laxman RK, Hochberg AK, Cheng HS, Roberts DA Thin Solid Films, 263(1), 117, 1995 |