검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
High-Density Plasma-Etching of III-V Nitrides Vartuli CB, Pearton SJ, Abernathy CR, Shul RJ, Howard AJ, Kilcoyne SP, Parmeter JE, Hagerottcrawford M Journal of Vacuum Science & Technology A, 14(3), 1011, 1996 |
| 2 |
Treatment of InP Surfaces in Radio-Frequency H-2 and H-2/CH4/Ar Plasmas - In-Situ Compositional Analysis, Etch Rates, and Surface-Roughness Parmeter JE, Shul RJ, Howard AJ, Miller PA Journal of Vacuum Science & Technology B, 14(6), 3563, 1996 |
| 3 |
Enhanced Chemical-Vapor-Deposition of Copper from (Hfac)Cu(Tmvs) Using Liquid Coinjection of Tmvs Petersen GA, Parmeter JE, Apblett CA, Gonzales MF, Smith PM, Omstead TR, Norman JA Journal of the Electrochemical Society, 142(3), 939, 1995 |
| 4 |
Characterization of Thin Copper-Films Grown via Chemical-Vapor-Deposition Using Liquid Coinjection of Trimethylvinylsilane and (Hexafluoroacetylacetonate) Cu (Trimethylvinylsilane) Parmeter JE, Petersen GA, Smith PM, Apblett CA, Reid JS, Norman JA, Hochberg AK, Roberts DA, Omstead TR Journal of Vacuum Science & Technology B, 13(1), 130, 1995 |
| 5 |
Chemical Additives for Improved Copper Chemical-Vapor-Deposition Processing Norman JA, Roberts DA, Hochberg AK, Smith P, Petersen GA, Parmeter JE, Apblett CA, Omstead TR Thin Solid Films, 262(1-2), 46, 1995 |
| 6 |
Surface-Reactions of Tetraneopentyl Zirconium on Zirconium Carbide Thin-Films Parmeter JE, Smith DC, Healy MD Journal of Vacuum Science & Technology A, 12(4), 2107, 1994 |