Thin Solid Films

Thin Solid Films, Vol.401, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (44 articles)

1 - 6	Crystallisation and electrical resistivity of sputter-deposited aluminium-germanium alloy films Boogard A, van den Broek JJ
7 - 34	The growth and structure of epitaxial niobium on sapphire Wildes AR, Mayer J, Theis-Brohl K
35 - 38	Cadmium telluride thin films: growth from solution and characteristics Patil VB, Sutrave DS, Shahane GS, Deshmukh LP
39 - 44	Pressure-dependence of etch rate in O-2 discharges Kim MT
45 - 51	FTIR investigations of tungsten oxide electrochromic films derived from organically modified peroxotungstic acid precursors Sharma N, Deepa M, Varshney P, Agnihotry SA
52 - 59	Effect of the composition and thermal annealing on the transformation temperatures of sputtered TiNi shape memory alloy thin films Surbled P, Clerc C, Le Pioufle B, Ataka M, Fujita H
60 - 66	Metal-organic chemical vapor deposition growth of GaN thin film on 3C-SiC/Si(111) substrate using various buffer layers Park CI, Kang JH, Kim KC, Nahm KS, Suh EK, Lim KY
67 - 72	Effect of antiferroelectric buffer on electric fatigue and leakage in ferroelectric Pb(Zr,Sn,Ti)NbO3 thin films Jang JH, Yoon KH
73 - 76	Formation of'environmentally friendly' semiconductor (beta-FeSi2) thin films prepared by ion beam sputter deposition (IBSD) method Sasase M, Nakanoya T, Yamamoto H, Hojou K
77 - 83	Micro-defects produced on a substrate by a glow discharge and the role of such defects on diamond nucleation Wang BB, Wang WL, Liao KJ
84 - 87	High rate deposition and electron beam recrystallization of silicon films for solar cells Rostalsky M, Muller J
88 - 93	Preparation of epitaxial TiO2 films by pulsed laser deposition technique Yamamoto S, Sumita T, Sugiharuto, Miyashita A, Naramoto H
94 - 101	Nanocrystalline silicon carbonitride thin films prepared by plasma beam-assisted deposition Cao ZX
102 - 105	Thin Au film with highly ordered arrays of hemispherical dots Gao T, Fan JC, Meng GW, Chu ZQ, Zhang LD
106 - 110	Effect of nitrogen ion implantation on the microstructural transformation of boron film Tian JZ, Xia LF, Zhang HD, Lee SR, Lu FX, Tang WH
111 - 117	Synthesis and properties of novel electroluminescent oligomers containing carbazolylene-vinylene-sulfonylene units for a light-emitting diode Jung HK, Lee CL, Lee JK, Kim JK, Park SY, Kim JJ
118 - 123	Photoluminescence of TiO2: Eu3+ thin films obtained by sol-gel on Si and Corning glass substrates Palomino-Merino R, Conde-Gallardo A, Garcia-Rocha M, Hernandez-Calderon I, Castano V, Rodriguez R
124 - 130	Formation of TiO2 thin films by hydrolysis of Ti-tetraethoxide in ethanol: kinetics, surface morphology, constituent phases and their formation mechanism Okudera H, Yokogawa Y
131 - 137	Self-assembly of organometallic clusters onto the surface of gold Guzman-Jimenez IY, Whitmire KH, Umezama-Vizzini K, Colorado R, Do JW, Jacobson A, Lee TR, Hong SH, Mirkin CA
138 - 144	Formation mechanism for TiOx thin film obtained by remote plasma enhanced chemical vapor deposition in H-2-O-2 mixture gas plasma Nakamura M, Kato S, Aoki T, Sirghi L, Hatanaka Y
145 - 149	Structural and optical characterization of nanocrystals of the InAs-InP system embedded in amorphous SiO2 thin films Zheng MJ, Zhang LD, Yang L, Li GH
150 - 158	Synthesis of SiO2 and SiOxCyHz thin films by microwave plasma CVD Barranco A, Cotrino J, Yubero F, Espinos JP, Benitez J, Clerc C, Gonzalez-Elipe AR
159 - 164	Molecular dynamics simulations of an Al2O3(0001 +/-, 0-10(II))/CeO2 (011 +/-,01-1(II)) interface system Baudin M, Wojcik M, Hermansson K
165 - 170	Surface smoothing and roughening in sputtered SnO2 films Lindstrom T, Isidorsson J, Niklasson GA
171 - 178	Effect of molecular adsorption at the liquid-metal interface on electronic conductivity: the role of surface morphology Fried GA, Zhang YM, Bohn PW
179 - 186	Low stress TiB2 coatings with improved tribological properties Berger M, Karlsson L, Larsson M, Hogmark S
187 - 195	Growth and structural characterization of yttria-stabilized zirconia-gold nanocomposite films with improved toughness Voevodin AA, Hu JJ, Jones JG, Fitz TA, Zabinski JS
196 - 202	Depth-sensitive analysis of a degraded tin oxide electrode surface in a plasma device application Lemoine P, Mariotti D, Maguire P, McLaughlin JA
203 - 210	A new technique to measure through film thickness fracture toughness Tsui TY, Joo YC
211 - 215	Electrochromic properties of rhodium oxide films prepared by a sol-gel method Wang HH, Yan MM, Jiang ZY
216 - 224	Optical characterisation of anatase: a comparative study of the bulk crystal and the polycrystalline thin film Viseu TMR, Almeida B, Stchakovsky M, Drevillon B, Ferreira MIC, Sousa JB
225 - 228	Spontaneous and stimulated emission in ZnCdTe-ZnTe quantum wells grown by LP-MOCVD Shan CX, Fan XW, Zhang JY, Zhang ZZ, Lu YM, Liu YC, Shen DZ
229 - 234	Effect of the deposition geometry on the electrical properties within Tin-doped indium oxide film deposited under a given RF magnetron sputtering condition You DJ, Choi SK, Han HS, Lee JS, Lim CB
235 - 242	Polycrystalline silicon thin films for microsystems: correlation between technological parameters, film structure and electrical properties Michelutti L, Chovet A, Stoemenos J, Terrot JM, Ionescu MA
243 - 250	Polyethersulfone foils as stable transparent substrates for conductive copper sulfide thin film coatings Nair PK, Cardoso J, Daza OG, Nair MTS
251 - 254	A blue organic emitting diode from anthracene derivative Jiang XY, Zhang ZL, Zheng XY, Wu YZ, Xu SH
255 - 266	Effects of corner position and operating condition on electromigration failure in angled bamboo lines without passivation layer Sasagawa K, Hasegawa M, Naito K, Saka M, Abe H
267 - 272	Three-dimensional structure of the copper porphyrazine layers at the air-water interface Valkova L, Borovkov N, Pisani M, Rustichelli F
273 - 278	Surface condition effects of the inter-metal dielectrics on interconnect aluminum film properties Kim SD, Rhee JK, Hwang IS, Park HM, Park HC
279 - 283	Silicon behavior in GaN grown by radiofrequency plasma molecular beam epitaxy Li W, Li AZ
284 - 290	Spectroscopic impedance studies of Al2O3 films deposited by spray pyrolysis Huanosta A, Alonso JC, Ortiz A
291 - 297	Residual stress and thermal expansion behavior of TaOxNy films by the micro-cantilever method Jong CA, Chin TS, Fang WL
298 - 305	In situ resistivity study of copper-cobalt films: precipitation, dissolution and phase transformation Zhang SL, Harper JME, Cabral C, d'Heurle FM
306 - 309	Lattice-mismatch induced-stress in porous silicon films Manotas S, Agullo-Rueda F, Moreno JD, Ben-Hander F, Martinez-Duart JM