Journal of Industrial and Engineering Chemistry, Vol.9, No.6, 787-791, November, 2003
Kinetics of the Methane Decomposition in a Dielectric-Barrier Discharge
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The effect of residence time on methane conversion, selectivities, and yields of products were studied in this work. Methane conversion was increased with the increase of the residence time. The maximum selectivities of ethane and propane were 29.5% and 14.0%, respectively, and they were the main products of methane conversion. Kinetics of the methane decomposition to C2, C3, and C4 in a dielectric-barrier discharge was studied at atmospheric pressure, and the kinetic model of methane decomposition was proposed. The calculated values of the product distribution from kinetic model were found to be in agreement with the experimental data. From the proposed model, the reaction rate constant k4 (C2H4 → C3H8) was the highest.
- Choi WJ, Park JY, Kim MS, Park HS, Hahm HS, J. Ind. Eng. Chem., 7(4), 187 (2001)
- Roh HS, Jun KW, Dong WS, Baek SC, Park SE, J. Ind. Eng. Chem., 8(5), 464 (2002)
- Roh HS, Jun KW, Baek SC, J. Ind. Eng. Chem., 9(2), 168 (2003)
- Hong SW, Oh SM, Park DW, Kim GJ, J. Ind. Eng. Chem., 7(6), 410 (2001)
- Fraser ME, Fee DA, Sheinson RS, 5, 163 (1985)
- Bhatnagar R, Mallinson RG, Methane and Alkane Conversion Chemistry, 249 (1995)
- Larkin DW, Lobban LL, Mallinson RG, Ind. Eng. Chem. Res., 40(7), 1594 (2001)
- Jeong HK, Kim SC, Han C, Lee H, Song HK, Na BK, Korean J. Chem. Eng., 18(2), 196 (2001)
- Liu CJ, Marafee A, Mallinson R, Lobban L, Appl. Catal. A: Gen., 164(1-2), 21 (1997)
- Lee H, Savinov SY, Song HK, Na BK, J. Chem. Eng. Jpn., 34(11), 1356 (2001)
- Savinov SY, Lee H, Song HK, Na BK, Ind. Eng. Chem. Res., 38(7), 2540 (1999)
- Marafee A, Liu CJ, Xu GH, Mallinson R, Lobban L, Ind. Eng. Chem. Res., 36(3), 632 (1997)
- Liu CJ, Mallinson R, Lobban L, J. Catal., 179(1), 326 (1998)
- Becker A, Hu Z, Httinger KJ, Fuel, 79, 1573 (2000)
- Eliasson B, Liu CJ, Kogelschatz U, Ind. Eng. Chem. Res., 39(5), 1221 (2000)
- Liu CJ, Xue B, Eliasson B, He F, Li Y, Xu GH, Plasma Chem. Plasma Process., 21, 301 (2001)
- Kozlov KV, Michel K, Wagner HE, Plasma Polym., 5, 129 (2000)
- Thanyachotpaiboon K, Chavadej S, Caldwell TA, Lobban LL, Mallinson RG, AIChE J., 44(10), 2252 (1998)
- Kim SS, Lee H, Na BK, Song HK, Korean J. Chem. Eng., 20(5), 869 (2003)