2263 - 2271 |
Impedance of Laminar Free-Convection and Thermal-Convection at a Vertical Electrode Citti I, Aaboubi O, Chopart JP, Gabrielli C, Olivier A, Tribollet B |
2271 - 2276 |
Electrochemical-Behavior of Nitride Ions in a Molten Chloride System Goto T, Tada M, Ito Y |
2276 - 2278 |
Effect of Rare-Earth Compositions on the Hydrogen Storage Properties of Ab(5)-Type Alloys and Pattern-Recognition Analysis Guo J, Li CH, Liu HL, Chen NY |
2279 - 2283 |
Stabilized Alpha-MnO2 Electrodes for Rechargeable 3 V Lithium Batteries Johnson CS, Mansuetto MF, Thackeray MM, Shaohorn Y, Hackney SA |
2284 - 2290 |
Negative-Resistance and Current Oscillation Phenomena in Oriented Polypropylene Films Lee JU, Kim GY, Jung IH, Park GH |
2290 - 2295 |
Electrochemical Hydrogen Absorbing Behavior of Pd and Pd-Li Alloys in a Molten LiCl-KCl-Lih System Nohira T, Ito Y |
2296 - 2301 |
Performance of Licoo2 Cathodes, Prepared Using the Pechini Method, in Molten-Carbonate Fuel-Cells Tennakoon TM, Lindbergh G, Bergman B |
2302 - 2307 |
Electrocatalytic Oxidation of Methanol on Polypyrrole Film-Modified with Platinum Microparticles Yang H, Lu TH, Xue KH, Sun SG, Lu GQ, Chen SP |
2307 - 2312 |
Formation and Dissolution of the Passive Film on Iron Studied by a Light Reflectance Technique Buchler M, Schmuki P, Bohni H |
2313 - 2317 |
The Effects of Organic-Compounds on Inhibition of Hydrogen Permeation Through a Mild-Steel Membrane Duarte HA, See DM, Popov BN, White RE |
2318 - 2323 |
Ellipsometric and Raman-Spectroscopic Study of Thermally Formed Films on Titanium Hristova E, Arsov L, Popov BN, White RE |
2323 - 2328 |
Spectroelectrochemical Study of the Role Played by Carbon Functionality in Fuel-Cell Electrodes Roy SC, Harding AW, Russell AE, Thomas KM |
2329 - 2333 |
Electroless Etching of ZnSe in Aqueous Ferricyanide Solutions - An Electrochemical Study Schoenmakers GH, Bakkers EP, Kelly JJ |
2334 - 2342 |
Role of O-3 in the Atmospheric Corrosion of Copper in the Presence of SO2 Strandberg H, Johansson LG |
2342 - 2346 |
Optimization of Chemical Bath Deposited Cadmium-Sulfide Thin-Films Oladeji IO, Chow L |
2346 - 2352 |
The Effect of pH Changes on the Giant Magnetoresistance of Electrodeposited Superlattices Alper M, Schwarzacher W, Lane SJ |
2352 - 2357 |
The Electrolytic Codeposition of Silica and Titania Modified Silica with Zinc Aslanidis D, Fransaer J, Celis JP |
2358 - 2363 |
Electroless Deposition of Cobalt Using Hydrazine as a Reducing Agent Djokic SS |
2364 - 2369 |
Surface Development During Electroless Copper Deposition Weber CJ, Pickering HW, Weil KG |
2369 - 2374 |
Electrochemistry of Tellurium(IV) in the Basic Aluminum Chloride-1-Methyl-3-Ethylimidazolium Chloride Room-Temperature Molten-Salt Jeng EG, Sun IW |
2374 - 2379 |
Peroxi-Coagulation of Aniline in Acidic Medium Using an Oxygen Diffusion Cathode Brillas E, Sauleda R, Casado J |
2380 - 2384 |
Equations for Densities and Dissociation-Constant of NaCl(Aq) at 25-Degrees-C from Zero to Saturation Based on Partial Dissociation Heyrovska R |
2384 - 2388 |
Effect of Partial Substitution on Hydrogen Storage Properties of Mg2Ni Alloy Kohno T, Kanda M |
2388 - 2392 |
Electrochemical Studies of Chromium(III) and Chromium(II) Chloride Complexes in Basic Aluminum Chloride-1-Methyl-3-Ethylimidazolium Chloride Room-Temperature Molten-Salts Liu JS, Chen PY, Sun IW, Hussey CL |
2392 - 2398 |
Relative Dielectric-Constant Measurements in the Butyronitrile-Chloroethane System at Subambient Temperatures Michnick RB, Rhoads KG, Sadoway DR |
2398 - 2404 |
In-Situ X-Ray-Absorption Near-Edge Structure Study of the Potential Dependence of the Formation of the Passive Film on Iron in Borate Buffer Oblonsky LJ, Davenport AJ, Ryan MP, Isaacs HS, Newman RC |
2404 - 2409 |
Thermodynamic Analysis of the Symmetry Factor and the Transfer-Coefficient in Electrode-Kinetics Reis JC |
2410 - 2416 |
Pyrolyzed Polysiloxanes for Use as Anode Materials in Lithium-Ion Batteries Xing WB, Wilson AM, Eguchi K, Zank G, Dahn JR |
2417 - 2420 |
The Effect of Salt Concentration in Electrolytes on the Maximum Energy-Storage for Double-Layer Capacitors Zheng JP, Jow TR |
2420 - 2426 |
A Transient Nonisothermal Model for Valve-Regulated Lead-Acid-Batteries Under Float Huang H, Vannguyen T |
2427 - 2432 |
Classification Criteria for Solid Oxide Fuel-Cell Electrode Materials Baker R, Guindet J, Kleitz M |
2432 - 2436 |
New Materials Consisting of Multicomponent Oxides for Thin-Film Gas Sensors Miyata T, Minami T, Shimokawa K, Kakumu T, Ishii M |
2437 - 2442 |
Comparison of TiSi2, CoSi2, and NiSi for Thin-Film Silicon-on-Insulator Applications Chen J, Colinge JP, Flandre D, Gillon R, Raskin JP, Vanhoenacker D |
2442 - 2447 |
Mechanism of Tungsten Atom Formation in Tungsten Etchback Using SF6/Ar Helicon Plasma Choi CJ, Seol YS, Kwon OS, Baik KH |
2448 - 2455 |
Direct Simulation Monte-Carlo of Inductively-Coupled Plasma and Comparison with Experiments Johannes J, Bartel T, Hebner GA, Woodworth J, Economou DJ |
2455 - 2461 |
X-Ray Photoelectron-Spectroscopy Analyses of Oxide-Masked Polycrystalline SiGe Features Etched in a High-Density Plasma Source Monget C, Vallon S, Bell FH, Vallier L, Joubert O |
2461 - 2467 |
Dry Development for 0.25 Mu-M Top Surface Imaging Vertommen J, Goethals AM |
2467 - 2472 |
End-Point and Etch Rate Control Using Dual-Wavelength Laser Reflectometry with a Nonlinear Estimator Vincent TL, Khargonekar PP, Terry FL |
2473 - 2479 |
Combined Real-Time and Run-to-Run Control of Etch Depth and Spatial Uniformity in Plasma-Etching Hankinson M, Vincent TL, Irani K, Khargonekar PP |
2479 - 2485 |
Transient and Permanent Effects of Direct-Current on Oxygen-Transfer Across YSZ-Electrode Interfaces Sridhar S, Stancovski V, Pal UB |
2486 - 2490 |
Reversibility of Photoelectrochromism at the TiO2/Methylene Blue Interface Detacconi NR, Carmona J, Rajeshwar K |
2490 - 2495 |
A Plated Through-Hole Interconnect Technology in Silicon Jaafar MA, Denton DD |
2495 - 2501 |
Influence of the Grain-Boundaries and Intragrain Defects on the Performance of Poly-Si Thin-Film Transistors Morimoto Y, Jinno Y, Hirai K, Ogata H, Yamada T, Yoneda K |
2501 - 2504 |
An Investigation on Grain-Boundary Trap Properties Using Staircase Charge-Pumping Technique in Polysilicon Thin-Film Transistors Kim KJ, Kim O |
2504 - 2508 |
On Anomalous Behavior of Dopant Diffusion-Coefficients at Very High-Concentrations Antoncik E |
2508 - 2516 |
Oxidation of Ti3Sic2 in Air Barsoum MW, Elraghy T, Ogbuji LU |
2517 - 2521 |
Low-Field Trap Generation Dependence on the Injection Current-Density in Gate Insulators - How Valid Are Accelerated Hot-Electron Measurements Kim HS, Reisman A, Williams CK |
2522 - 2525 |
Electromigration Performance of W-Plug via-Fed Lead Structures Le HA, Tso NC, Mcpherson JW |
2525 - 2530 |
Plasma Charging Damage and Water-Related Hot-Carrier Reliability in the Deposition of Plasma-Enhanced Tetraethylorthosilicate Oxide Lin YM, Jang SM, Yu CH, Lei TF, Chen JY |
2531 - 2537 |
Reduction-Mechanism in the Dielectric-Constant of Fluorine-Doped Silicon Dioxide Film Lim SW, Shimogaki Y, Nakano Y, Tada K, Komiyama H |
2538 - 2541 |
Characteristics of Silicon-Field Emitter Arrays Fabricated by Using Wafers Separated by Implantation of Oxygen Matsuzaki K, Uematsu T, Ryokai Y, Amano A |
2541 - 2547 |
Suppression of Aluminum Contamination in Polysilicon Reactive Ion Etching Using Highly Purified Chlorine Gas Sato M, Arita Y |
2548 - 2551 |
Phosphorus Pileup and Sublimation at the Silicon Surface Sato Y, Imai K, Yabumoto N |
2552 - 2558 |
Diffusion Mechanism of Phosphorus from Phosphorus Vapor in Amorphous-Silicon Dioxide Film Prepared by Thermal-Oxidation Susa M, Kawagishi K, Tanaka N, Nagata K |
2559 - 2564 |
Improvement of Adhesion Properties of Fluorinated Silica Glass-Films by Nitrous-Oxide Plasma Treatment Swope R, Yoo WS, Hsieh J, Shuchmann S, Nagy F, Nijenhuis HT, Mordo D |
2565 - 2572 |
Cleaning of Chf3 Plasma-Etched SiO2/Sin/Cu via Structures with Dilute Hydrofluoric-Acid Solutions Ueno K, Donnelly VM, Kikkawa T |
L177 - L180 |
Preparation of Lifeo2 with Alpha-Nafeo2-Type Structure Using a Mixed-Alkaline Hydrothermal Method Ado K, Tabuchi M, Kobayashi H, Kageyama H, Nakamura O, Inaba Y, Kanno R, Takagi M, Takeda Y |
L180 - L184 |
Methyl Propyl Carbonate - A Promising Single Solvent for Li-Ion Battery Electrolytes Eineli Y, Mcdevitt SF, Aurbach D, Markovsky B, Schechter A |
L185 - L187 |
Correlation Between Composition, Microstructure, and Ferroelectric Properties of Srbi2Ta2O9 Thin-Films Ono S, Sakakibara A, Seki T, Osaka T, Koiwa I, Mita J, Iwabuchi T, Asami K |
L187 - L190 |
Carbonaceous Anodes for Lithium-Ion Batteries Prepared from Phenolic Resins with Different Cross-Linking Densities Xiang HQ, Fang SB, Jiang YY |
L190 - L192 |
On the Vacuum-Ultraviolet Excited Luminescence of Pr3+ in Lab3O6 Srivastava AM, Doughty DA, Beers WW |
L193 - L195 |
Preparation of Giant Magnetoresistance Co-Cu Heterogeneous Alloys by Electrodisposition Jyoko Y, Kashiwabara S, Hayashi Y |
L196 - L197 |
Formation of Nanocrystalline Surface-Layers by Annealing and Their Role in Filiform Corrosion of Aluminum Sheet Letholsen H, Nordlien JH, Nisancioglu K |
L198 - L200 |
Zirconia-Based Potentiometric Sensor Using a Pair of Oxide Electrodes for Selective Detection of Carbon-Monoxide Miura N, Raisen T, Lu GY, Yamazoe N |
L200 - L202 |
Pulse-Reverse Plating of Nanocomposite Thin-Films Podlaha EJ, Landolt D |
L203 - L204 |
Electrochemical Preparation of Soft-Magnetic Conifes Film with High Saturation Magnetic-Flux Density and High-Resistivity Takai M, Hayashi K, Aoyagi M, Osaka T |