Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.17, No.1 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (52 articles)

1 - 8	Homoepitaxial growth of CdTe on vicinal CdTe(100) surfaces: Reaction kinetics and mechanism Yong KJ, Martinez H, Gellman AJ, Sides PJ
9 - 13	Molecular beam epitaxial growth and structural properties of Bi1-xSbx alloy thin films on CdTe(III) substrates Cho SL, DiVenere A, Wong GK, Ketterson JB, Meyer JR
14 - 18	Room-temperature growth of ZrO2 thin films using a novel hyperthermal oxygen-atom source Wisotzki E, Balogh AG, Hahn H, Wolan JT, Hoflund GB
19 - 25	Low energy ion beam etching of CuInSe2 surfaces Otte K, Lippold G, Frost A, Schindler A, Bigl F, Yakushev MV, Tomlinson RD
26 - 37	Study of the SiO2-to-Si3N4 etch selectivity mechanism in inductively coupled fluorocarbon plasmas and a comparison with the SiO2-to-Si mechanism Schaepkens M, Standaert TEFM, Rueger NR, Sebel PGM, Oehrlein GS, Cook JM
38 - 51	Characterization of Cl-2/Ar high density plasmas for semiconductor etching Eddy CR, Leonhardt D, Douglass SR, Thoms BD, Shamamian VA, Butler JE
52 - 55	Response surface study of inductively coupled plasma etching of GaAs/AlGaAs in BCl3/Cl-2 Agarwala S, King O, Horst S, Wilson R, Stone D, Dagenais M, Chen YJ
56 - 61	Reactive ion etching of GaN and GaAs: Radially uniform processes for rectangular, smooth sidewalls Franz G, Rinner F
62 - 69	Penning type magnetron sputtering source and its use in the production of carbon nitride coatings Murphy MJ, Monaghan J, Tyrrell M, Walsh R, Cameron DG, Chowdhury AKMS, Monclus M, Hashmi MSJ
70 - 76	Abnormal steady states in reactive sputtering Zhu SL, Wang FH, Wu WT
77 - 82	Hollow cathode magnetron Wang ZH, Cohen SA
83 - 87	Ferroelectric SrBi2Ta2O9 thin film deposition at 550 degrees C by plasma-enhanced metalorganic chemical vapor deposition onto a metalorganic chemical vapor deposition platinum bottom electrode Seong NJ, Choi ES, Yoon SG
88 - 92	Effect of prepared GaAs surface on the sulfidation with (NH4)(2)S-x solution Kang MG, Park HH
93 - 96	Surface roughness and oxide contents of gas-phase and solution-phase polysulfide passivation of III-V surfaces Choy WH, Kwok RWM, So BKL, Hui GKC, Chen YJ, Xu JB, Wong SP, Lau WM
97 - 101	Passivation of CdZnTe surfaces by oxidation in low energy atomic oxygen Chen H, Chattopadhyay K, Chen KT, Burger A, George MA, Gregory JC, Nag PK, Weimer JJ, James RB
102 - 107	Deposition of high quality silicon dioxide on Hg1-xCdxTe by low-temperature liquid phase deposition method Wang NF, Chang WJ, Houng MP, Wang YH, Huang CJ
108 - 112	Hydrogenated silicon nitride thin films deposited between 50 and 250 degrees C using nitrogen/silane mixtures with helium dilution Klein TM, Anderson TM, Chowdhury AI, Parsons GN
113 - 120	Deposition of ultrapure hydrogenated amorphous silicon Kamei T, Matsuda A
121 - 124	Deposition of diamond-like carbon films using the screen grid method in electron cyclotron resonance chemical vapor deposition Yoon SF, Ahn RJ, Zhang Q, Wu YS, Yang H
125 - 132	Diagnostics and modeling in a pure argon plasma: Energy balance study Kelkar UM, Gordon MH, Roe LA, Li Y
133 - 137	High temperature oxidation of (Ti1-xAlx)N coatings made by plasma enhanced chemical vapor deposition Kim BJ, Kim YC, Nah JW, Lee JJ
138 - 143	Diagnostics of the diamond depositing inductively coupled plasma by electrostatic probes and optical emission spectroscopy Teii K
144 - 149	Kinetics of platinum silicide formation followed in situ by spectroscopic ellipsometry Zhou SM, Hundhausen M, Stark T, Chen LY, Ley L
150 - 154	Ultraviolet-ozone jet cleaning process of organic surface contamination layers Moon DW, Kurokawa A, Ichimura S, Lee HW, Jeon IC
155 - 158	Effect of laser-induced dissociation of SiH3 radicals in SiH4 plasmas during atomic hydrogen measurements using laser-induced fluorescence by a two-photon excitation Miyazaki K, Mishiro Y, Kajiwara T, Uchino K, Muraoka K, Okada T, Maeda M
159 - 163	Room temperature visible electroluminescence in silicon nanostructures Wu W, Huang XF, Chen KJ, Xu JB, Gao X, Xu J, Li W
164 - 169	Fermi level pinning on HF etched silicon surfaces investigated by photoelectron spectroscopy Schlaf R, Hinogami R, Fujitani M, Yae S, Nakato Y
170 - 175	Spectroscopic analysis of photochromic films Mo YG, Dillon RO, Snyder PG
176 - 182	Continuity and topography of ultrathin diamond-like carbon films characterized by scanning electron microscopy energy dispersive x-ray analysis and atomic force microscopy Lemoine P, Mc Laughlin JM
183 - 189	Generation of atomic nitrogen flux monitoring by an atomic absorption detection system at 120 nm Wang WZ, Hammond RH, Arnason SB, Beasley MR
190 - 197	Intelligent process control of indium tin oxide sputter deposition using optical emission spectroscopy Eisgruber IL, Engel JR, Hollingsworth RE, Bhat PK, Wendt R
198 - 205	Lithium depth profiling in thin electrochromic WO3 films Krings LHM, Tamminga Y, van Berkum J, Labohm F, van Veen A, Arnoldbik WM
206 - 211	Design and experimental approach of optical reflection filters with graded refractive index profiles Wang X, Masumoto H, Someno Y, Hirai T
212 - 228	Vapor deposition modeling for an entrenched wafer geometry Willett LJ, Loyalka SK, Tompson RV
229 - 234	Solution of the outgassing equation for the pump down of an unbaked vacuum system Akaishi K
235 - 241	Viscosity and velocity slip coefficients for gas mixtures: Measurements with a spinning rotor gauge Bentz JA, Tompson RV, Loyalka SK
242 - 248	Design and performance of an ultrahigh vacuum system for metallic multilayers Chaudhari SM, Suresh N, Phase DM, Gupta A, Dasannacharya BA
249 - 255	Crystalline structure of very hard tungsten carbide thin films obtained by reactive pulsed laser deposition Mihailescu IN, Gyorgy E, Marin G, Popescu M, Teodorescu VS, Van Landuyt J, Grivas C, Hatziapostolou A
256 - 265	Monte Carlo simulation of growth and decay processes in a cluster aggregation source Briehl B, Urbassek HM
266 - 274	Modeling vapor deposition of low-K polymers: Parylene and polynaphthalene Rogojevic S, Moore JA, Gill WN
275 - 281	Plasma induced copolymerization of hexafluoropropylene and octafluoropropane Leezenberg PB, Reiley TC, Tyndall GW
282 - 290	Heterogeneous recombination of atomic bromine and fluorine Kota GP, Coburn JW, Graves DB
291 - 296	Direct observation of Na and O impurities at grain surfaces of CuInSe2 thin films Niles DW, Al-Jassim M, Ramanathan K
297 - 302	Nanofabrication of model catalysts and simulations of their reaction kinetics Johansson S, Wong K, Zhdanov VP, Kasemo B
303 - 305	Secondary ion coincidence in highly charged ion based secondary ion mass spectroscopy for process characterization Hamza AV, Schenkel T, Barnes AV, Schneider DH
306 - 309	Passivation and performance analysis of thin film Peltier heat pumps Shafai C, Brett MJ, Broughton JN
310 - 313	Hollow cathode sputtering cluster source for low energy deposition: Deposition of Fe small clusters Ishii K, Amano K, Hamakake H
314 - 316	Deposition of amorphous nitrogenated carbon films using an alternate plasma deposition method in a dual electron cyclotron resonance-radio frequency plasma Hong JG, Turban G
317 - 318	Low-cost modification for the high-frequency raster on the Cameca IMS-3F secondary ion mass spectrometer Reedy RC, Young MR, Asher SE
319 - 321	A new and simple variable-angle accessory for infrared specular reflectance Polo MC, Ferrer N, Romero M, Perez J, Quevedo M, Vilardell F
322 - 322	Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition (vol A16, pg 2198, 1998) Foster JE, Wendt AE, Wang WW, Booske JH
323 - 323	Chemical downstream etching of tungsten (vol A16, pg 2115, 1998) Blain MG, Jarecki RL, Simonson RJ