Thin Solid Films

Thin Solid Films, Vol.308-309 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (116 articles)

1 - 7	Electrical, optical and structural characteristics of indium-tin-oxide thin films deposited on glass and polymer substrates Kulkarni AK, Schulz KH, Lim TS, Khan M
8 - 12	Optical scattering enhanced by silicon micromachined surfaces Kolesar ES, Bright VM, Sowders DM
V - V	Papers presented at the 24th International Conference on Metallurgical Coatings and Thin Films, San Diego, CA, USA, April 21-25, 1997 - Preface Givens JH, Matthews A, Mitterer C, Rohde SL
13 - 18	Preparation of transparent conducting In4Sn3O12 thin films by DC magnetron sputtering Minami T, Takeda Y, Takata S, Kakumu T
19 - 25	PML/oxide/PML barrier layer performance differences arising from use of UV or electron beam polymerization of the PML layers Affinito JD, Eufinger S, Gross ME, Graff GL, Martin PM
26 - 30	The use of experimental design techniques to meet reflected color targets in pyrolytic low emissivity coatings Neuman GA, Stewart-Davis SL
31 - 37	Sensitivity of variable angle spectroscopic ellipsometry to isotropic thin film properties Urban FK, Barton D
38 - 41	Investigations on the structure of boron nitride films Fukarek W, Kruse O, Kolitsch A, Moller W
42 - 49	Ellipsometric studies of thermally induced transformation phenomena in oxide films Rose A, Exarhos GJ
50 - 55	Analysis of binary electrochromic tungsten oxides with effective medium theory von Rottkay K, Ozer N, Rubin M, Richardson T
56 - 62	Spectroscopic characterization of processing-induced property changes in doped ZnO films Exarhos GJ, Rose A, Windisch CF
63 - 67	Plasma enhanced chemical vapour deposition of silica thin films in an integrated distributed electron cyclotron resonance reactor Bulkin P, Bertrand N, Drevillon B, Rostaing JC, Delmotte F, Hugon MC, Agius B
68 - 73	Post-deposition processing of low temperature PECVD silicon dioxide films for enhanced stress stability Haque MS, Naseem HA, Brown WD
74 - 78	Morphology of dual beam ion sputtered films investigated by atomic force microscopy Lee CC, Hsu JC, Wei DT, Lin JH
79 - 84	Electronic properties and impurity levels in filtered cathodic vacuum are (FCVA) amorphous silicon Bilek MMM, Milne WI
85 - 89	Fabrication and characterization of spherical polycrystalline diamond emitter arrays Chen CF, Huang WH
90 - 93	Photoresist characteristics of polyurea films prepared by vapor deposition polymerization Sato M, Iijima M, Takahashi Y
94 - 100	Formation of cubic boron nitride by the reactive sputter deposition of boron Jankowski AF, Hayes JP, Makowiecki DM, McKernan MA
101 - 106	A novel approach to deposition of cubic boron nitride coatings Konyashin I, Loeffler J, Bill J, Aldinger F
107 - 112	Vibrational spectroscopy of mixed hexagonal-cubic boron nitride thin films Beghi MG, Bottani CE, Miotello A, Ossi PM
113 - 117	Superhard coatings of CNx/ZrN multilayers prepared by DC magnetron sputtering Wu ML, Qian WD, Chung YW, Wang YY, Wong MS, Sproul WD
118 - 125	Low-energy ion bombardment effects in reactive rf magnetron sputtering of carbon nitride films Kaltofen R, Sebald T, Weise G
126 - 129	Preparation of a novel target material for carbon nitride film deposition Lu TR, Kuo CT, Chen TM
130 - 134	The composition and bonding structure of CNx films and their influence on the mechanical properties Chowdhury AKMS, Monclus M, Cameron DC, Gilvarry J, Murphy MJ, Barradas NP, Hashmi MSJ
135 - 140	Optical and mechanical properties of amorphous CN films Lee S, Park SJ, Oh SG, Kim WM, Bae JH, Cheong BK, Kim SG
141 - 146	High pressure high power microwave plasma chemical vapor deposition of large area diamond films Naseem HA, Haque MS, Khan MA, Malshe AP, Brown WD
147 - 153	About the growth of diamond crystals obtained by the combustion-flame method : use for coatings on large area substrates Le Huu T, Zaidi H, Paulmier D
154 - 158	Optical emission spectroscopy of the plasma during microwave CVD of diamond thin films with nitrogen addition and relation to the thin film morphology Vandevelde T, Nesladek M, Quaeyhaegens C, Stals L
159 - 162	Growth of flake-like diamond crystal using polymer precursor Sun Z, Shi X, Tay BK, Wang X, Sun Y
163 - 167	An improved method for large-area oriented nucleation of diamond during bias process via hot-filament chemical vapor deposition Li X, Hayashi Y, Nishino S
168 - 172	Analysis of intrinsic stress distribution in grains of high duality CVD diamond film by micro-Raman spectroscopy Vlasov II, Ralchenko VG, Obraztsova ED, Smolin AA, Konov VI
173 - 177	Electrical properties of diamond-like nanocomposite coatings Venkatraman C, Goel A, Lei R, Kester D, Outten C
178 - 185	Study for fabricating large area diamond single-crystal layers Findeling-Dufour C, Gicquel A
186 - 190	Heat treatment of cathodic arc deposited amorphous hard carbon films Anders S, Ager JW, Pharr GM, Tsui TY, Brown IG
191 - 194	Surface analysis and bioreactions of F and Si containing a-C : H Hauert R, Muller U, Francz G, Birchler F, Schroeder A, Mayer J, Wintermantel E
195 - 198	Surface relaxation during plasma chemical vapor deposition of diamond-like carbon films, investigated by in-situ ellipsometry von Keudell A, Schwarz-Selinger T, Jacob W
199 - 203	Growth conditions and properties of tetrahedral amorphous carbon films Tay BK, Shi X, Cheah LK, Flynn DI
204 - 208	Field emission from cleaved diamond fibers Glesener JW, Lin HB, Morrish AA
209 - 214	Evaluation of buffer layers for hot filament chemical vapor deposition diamond films on silicon substrates Kumar A, You Q, Kapat JS, Mangiaracina A, Catletge A, Vohra Y
215 - 218	Metallization of CVD diamond films by cathodic arc deposition Monteiro OR, Salvadori MC, Cattani M, Mammana V, Brown IG
219 - 222	Low temperature plasma enhanced chemical vapour deposition boron nitride Carreno MNP, Bottecchia JP, Pereyra I
223 - 227	Reactive magnetron sputtering of CNx thin films at different substrate bias Zheng WT, Broitman E, Hellgren N, Xing KZ, Ivanov I, Sjostrom H, Hultman L, Sundgren JE
228 - 232	Production and characterisation of carbon nitride thin films produced by a graphite hollow cathode system Muhl S, Gaona-Couto A, Mendez JM, Rodil S, Gonzalez G, Merkulov A, Asomoza R
233 - 238	Deposition of carbon nitride films by vacuum ion diode with explosive emission Korenev SA, Perry AJ, Elkind A, Kalmukov A
239 - 244	Preparation of carbon nitride thin films by ion beam assisted deposition and their mechanical properties Kohzaki M, Matsumuro A, Hayashi T, Muramatsu M, Yamaguchi K
245 - 248	Improving thickness uniformity of freestanding diamond sheets synthesized by the combustion flame method Murakawa M, Suzuki M, Takeuchi S
249 - 253	Measurement of internal stresses in CVD diamond films Nakamura Y, Sakagami S, Amamoto Y, Watanabe Y
254 - 257	Studies on CVD-diamond on Ti6Al4V alloy surface using hot filament assisted technique de Souza TM, Leite NF, Trava-Airoldi VJ, Corat EJ
258 - 262	Study of porosity in permeable diamond membranes Mammana VP, Salvadori MC, Brown IG
263 - 267	Structural dependence of mechanical properties of Si incorporated diamond-like carbon films deposited by RF plasma-assisted chemical vapour deposition Lee KR, Kim MG, Cho SJ, Eun KY, Seong TY
268 - 272	Optical properties of tetrahedral amorphous carbon films determined by spectroscopic ellipsometry Tay BK, Shi X, Cheah LK, Flynn DI
273 - 278	Application of heat treatment and dispersive strengthening concept in interlayer deposition to enhance diamond film adherence Lin CR, Kuo CT, Chang RM
279 - 283	Investigation of distribution of defects and impurities in boron-doped CVD diamond film by cathodoluminescence spectroscopy Wang CL, Hatta A, Jiang N, Won JH, Ito T, Hiraki A, Jin ZS, Zou GT
284 - 288	Optical characterization of nitrogenated carbon overcoats Chia RWJ, Li E, Sugi S, Li GG, Zhu H, Forouhi AR, Bloomer I
289 - 296	Between nanoindentation and scanning force microscopy : measuring mechanical properties in the nanometer regime Baker SP
297 - 303	Novel nanoindentation method for characterising multiphase materials Randall NX, Julia-Schmutz C, Soro JM, von Stebut J, Zacharie G
304 - 309	Investigation of the elastic modulus of thin films using simple biaxial bending techniques Jamting AK, Bell JM, Swain MV, Schwarzer N
310 - 314	A practical method for the determination of the Young's modulus and residual stresses of PVD thin films Tran MD, Poublan J, Dautzenberg JH
315 - 322	Determination of the fatigue properties of multilayer PVD coatings on various substrates, based on the impact test and its FEM simulation Bouzakis KD, Vidakis N, Leyendecker T, Erkens G, Wenke R
323 - 328	Bending stiffness measurements of magnetic tapes and substrates Scott WW, Bhushan B
329 - 333	A comparative assessment of three approaches for ranking the adhesion of TiN coatings onto two steels Kuper A, Clissold R, Martin PJ, Swain MV
334 - 339	Characterisation of TiN thin films using the bulge test and the nanoindentation technique Karimi A, Shojaei OR, Kruml T, Martin JL
340 - 344	Nanotribology of ultrathin a : SiC/SiC-N overcoats using a depth sensing nanoindentation multiple sliding technique Scharf TW, Barnard JA
345 - 350	Influence of surface integrity on performance of coated cutting tools Tonshoff HK, Blawit C
351 - 357	A Mossbauer spectroscopy study of Ti-Fe interfaces produced by the PVD process Brooks JS, Davidson JL, Forder SD, Munz WD, Larsson M
358 - 362	Materials characterization of Si1-x-yGexCy/Si superlattice structures Laursen T, Chandrasekhar D, Smith DJ, Mayer JW, Croke ET, Hunter AT
363 - 368	Crystallization and residual stress formation of sol-gel-derived zirconia films Mehner A, Klumper-Westkamp H, Hoffmann F, Mayr P
369 - 374	Applications of focused ion beam machining to the characterization of carbide, nitride and oxide films Presser N, Hilton MR
375 - 381	Auger depth profiles and stud pull adhesion of metal films on graphite-epoxy composites Kraatz P, Lee TH, Weil L
382 - 388	Elemental depth profiling of coated and surface-modified materials by GD-OES : hard coatings on cutting tools Weiss Z, Marshall K
389 - 392	TEM specimen preparation and characterization of ceramic coatings on fiber tows Hay RS, Welch JR, Cinibulk MK
393 - 398	Modification of a disordered Ni3Fe alloy surface by 50 keV Zr ion implantation Sharkeev YP, Perry AJ, Geist DE, Ryabchikov AI, Tailashev AS, Girsova NV, Kozlov EV
399 - 405	The small angle cleavage technique applied to coatings and thin films Walck SD, McCaffrey JP
406 - 409	Structural characterization of pulsed laser-deposited AlN thin films on semiconductor substrates Kumar A, Chan HL, Weimer JJ, Sanderson L
410 - 414	A comparative study of refractory metal nitridation in an NH3 ambient Zou YL, Alford TL, Zeng YX, Laursen T, Ulrich BM
415 - 419	A study of ion-bombarded nanostructures on germanium surfaces by scanning probe microscopy Chen YJ, Cheung WY, Wilson IH, Wong SP, Xu JB
420 - 424	Structural inhomogeneities in thin epitaxial films of YBa2Cu3O7-delta and their effects on superconducting properties Qadri SB, Skelton EF, Broussard PR, Cestone VC, Osofsky MS, Browning VM, Reeves ME, Prusseit W
425 - 429	Glow discharge optical spectroscopy depth profiles of ion implanted steel, titanium and titanium nitride coatings Seidel F, Stock HR, Mayr P
430 - 435	Influence of electroless Ni-P deposits on the corrosion-fatigue properties of an AISI 1045 steel Chitty J, Pertuz A, Hintermann H, Staia MH, Puchi ES
436 - 442	Thermal fatigue of hot work tool steel with hard coatings Starling CMD, Branco JRT
443 - 447	Electromigration in 0.25 mu m wide Cu line on W Hu CK, Lee KY, Gignac L, Carruthers R
448 - 454	Titanium-nitride self-encapsulation of Cu and Ag films on silicon dioxide Adams D, Laursen T, Alford TL, Mayer JW
455 - 459	Metallization of sub-micron trenches and vias with high aspect ratio Siemroth P, Wenzel C, Klimes W, Schultrich B, Schulke T
460 - 464	Characterization of Al-1 wt% Y thin films for VLSI interconnects Liu Y, Poole KF, Singh R, Harriss J, Diefendorf RJ
465 - 469	Microstructures of copper thin films prepared by chemical vapor deposition Cho NI, Park DI
470 - 474	Copper diffusion in organic polymer resists and inter-level dielectrics Godbey DJ, Buckley LJ, Purdy AP, Snow AW
475 - 479	Heat resistant polyimide films with low dielectric constant by vapor deposition polymerization Ukishima S, Iijima M, Sato M, Takahashi Y, Fukada E
480 - 485	Fundamental insight on developing low dielectric constant polyimides Simpson JO, St Clair AK
486 - 489	The dissolution of copper in common solvents used for low dielectric polymers Purdy AP, Godbey D, Buckley L
490 - 494	Application of SiO2 aerogel film with low dielectric constant to intermetal dielectrics Jo MH, Hong JK, Park HH, Kim JJ, Hyun SH, Choi SY
495 - 500	Preparation and characterization of porous silica xerogel film for low dielectric application Hong JK, Yang HS, Jo MH, Park HH, Choi SY
501 - 506	Stabilizing dielectric constant of fluorine-doped SiO2 film by N2O and NH3 plasma post-treatment Mei YJ, Chang TC, Chang SJ, Pan FM, Chen MSK, Tuan A, Chou S, Chang CY
507 - 511	Deposition of stable, low kappa and high deposition rate SiF4-doped TEOS fluorinated silicon dioxide (SiOF) films Bhan MK, Huang J, Cheung D
512 - 517	Cartesian coordinate maps for chemical mechanical planarization uniformity characterization Bibby TFA, Harwood R, Schey D, McKinley K
518 - 522	Effects of corrosion environments on the surface finishing of copper chemical mechanical polishing Wang MT, Tsai MS, Liu C, Tseng WT, Chang TC, Chen LJ, Cheng MC
523 - 528	Damascene copper interconnects with polymer ILDs Price DT, Gutmann RJ, Murarka SP
529 - 532	Surface interaction forces in chemical-mechanical planarization Rajan K, Singh R, Adler J, Mahajan U, Rabinovich Y, Moudgil BM
533 - 537	Stress distribution in chemical mechanical polishing Srinivasa-Murthy C, Wang D, Beaudoin SP, Bibby T, Holland K, Cale TS
538 - 542	CMP CoO reduction : slurry reprocessing Bibby TFA, Adams JA, Holland K, Krulik GA, Parikh P
543 - 549	Effects of underlying films on the chemical-mechanical polishing for shallow trench isolation technology Wang YL, Liu C, Feng MS, Dun JW, Chou KS
550 - 554	Chemical-mechanical polishing of low-dielectric-constant spin-on-glasses : film chemistries, slurry formulation and polish selectivity Wang YL, Liu C, Chang ST, Tsai MS, Feng MS, Tseng WT
555 - 561	Chemical-mechanical polishing as an enabling technology for giant magnetoresistance devices Hu YZ, Gutmann RJ, Chow TP, Bussmann K, Cheng SF, Prinz GA
562 - 569	Dose-rate effects on the formation of ultra-shallow junctions with low-energy B+ and BF2+ ion implants Downey DF, Osburn CM, Cummings JJ, Daryanani S, Falk SW
570 - 574	Reaction of amorphous Si with cobalt silicide before disilicide formation for reducing Si consumption in SIMOX Maa JS, Hsu ST, Ulrich B, Peng CH
575 - 579	Edge leakage of cobalt silicided shallow junctions Peng CH, Maa JS, Hsu ST
580 - 584	Synchrotron radiation characterization of metal silicide thin films : some observations Naftel SJ, Coulthard I, Sham TK, Xu DX, Erickson L, Das SR
585 - 588	The effects of screen oxide and low temperature BPSG anneal on titanium salicide formation Lee KN, Ahn JG, Hwang H, Byun JS, Lee YJ
589 - 593	Electrical properties of Ti/TiN films prepared by chemical vapor deposition and their applications in submicron structures as contact and barrier materials Hu J, Ameen M, Leusink G, Webb D, Hillman JT
594 - 598	Characterization of TiN film grown by low-pressure-chemical-vapor-deposition Mei YJ, Chang TC, Hu JC, Chen LJ, Yang YL, Pan FM, Wu WF, Ting A, Chang CY
599 - 606	A survey of ohmic contacts to III-V compound semiconductors Baca AG, Ren F, Zolper JC, Briggs RD, Pearton SJ
607 - 610	Thermal stability of the non-alloyed Pd/Sn and Pd/Ge ohmic contacts to n-GaAs Islam MS, McNally PJ, Cameron DC
611 - 614	Electrical and mechanical properties of MgO thin films on GaAs Soto R, Mergui S, Schmidt PE
615 - 620	Some effects of temperature ramping on metal organic chemical vapor deposited Al film nucleation Yang D, Jonnalagadda R, Mahadev V, Cale TS, Hillman JT, Foster RF, Rogers BR
621 - 626	Improved ozone-tetraethoxysilane oxide reliability for deep submicron inter-metal dielectric applications by deposition of a silane-based oxide underlayer Lin CF, Tseng WT, Chang YF, Feng MS
627 - 633	Correlation of morphology and electrical properties of nanoscale TiSi2 epitaxial islands on Si (001) Yang W, Jedema FJ, Ade H, Nemanich RJ
634 - 642	The characterization of etched GaAs surface with HCl or H3PO4 solutions Kang MG, Sa SH, Park HH, Suh KS, Oh KH