Thin Solid Films

Thin Solid Films, Vol.258, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (56 articles)

1 - 4	Hydrogen and Deuterium Migration in Annealed Plasma-Deposited Silicon-Nitride Films Savall C, Bruyere JC
5 - 9	Characteristics of Pt Thin-Films on the Conducting Ceramics Tio and Ebonex (Ti4O7) as Electrode Materials Park SY, Mho SI, Chi EO, Kwon YU, Park HL
10 - 13	C-13 Nuclear-Magnetic-Resonance Signals of Ge/C Films Deposited from Tetraethylgermanium in an RF Glow-Discharge Gazicki M, Potrzebowski MJ, Tyczkowski J, Schalko J
14 - 20	High-Power Deposition and Analytics of Amorphous-Silicon Carbide Films Heyner R, Marx G
21 - 25	Growth of Boron-Nitride Thin-Films by Metal-Organic Chemical-Vapor-Deposition Phani AR, Roy S, Rao VJ
26 - 33	Thickness Variation Effects on X-Ray-Scattering of Multilayers Boufelfel A, Falco CM
34 - 39	Thermal-Stability of Pulsed-Laser Deposited Diamond-Like Carbon-Films Ong CW, Zhao XA, Cheung JT, Lam SK, Liu Y, Choy CL, Chan PW
40 - 45	Laser Reactive Ablation Deposition of Titanium Carbide Films Leggieri G, Luches A, Martino M, Perrone A, Majni G, Mengucci P, Mihailescu IN
46 - 50	Sputter Ion Plating of Tungsten on CVD Grown Diamonds for Laser Thermal-Diffusivity Measurement Ahmed NA, Preston SD
51 - 55	Structure of TiNx (0-Less-Than-X-Less-Than-1.1) Films Prepared by Iron Beam-Assisted Deposition Jiang H, Tao K, Li H
56 - 63	Structures of Tantalum Pentoxide Thin-Films Formed by Reactive Sputtering of Ta Metal Chang PH, Liu HY
64 - 66	Preparation of SiC Films by Solid-State Source Evaporation Fissel A, Schroter B, Krausslich J, Richter W
67 - 74	Characterization of Trimethylaluminum-N2O-He Glow-Discharge in Plasma-Enhanced Chemical-Vapor-Deposition of Aluminum-Oxide Films Kim YC, Chun JS, Lee WJ
75 - 81	Nanotribological Characterization of Hydrogenated Carbon-Films by Scanning Probe Microscopy Jiang ZG, Lu CJ, Bogy DB, Bhatia CS, Miyamoto T
82 - 85	Low-Temperature Synthesis of Pb1-Xlax(Zr1-Ytiy)(1-X/4)O-3 Films by Pulsed-Laser Deposition Yeh MH, Liu KS, Lin IN
86 - 90	Growth and Characterization of Polycrystalline InSe Thin-Films Parlak M, Ercelebi C, Gunal I, Salaeva Z, Allakhverdiev K
91 - 103	Ion-Beam Sputtering of (Ta2O5)(X)-(SiO2)(1-X) Composite Thin-Films Cevro M
104 - 109	Modeling of the Formation of RuO2 Thin-Film from Ru(C5H5)(2) by Metal-Organic Chemical-Vapor Decomposition Mar SY, Huang YS, Tiong KK
110 - 114	X-Ray Photoelectron-Spectroscopy Characterization of Amorphous Molybdenum Oxysulfide Thin-Films Benoist L, Gonbeau D, Pfisterguillouzo G, Schmidt E, Meunier G, Levasseur A
115 - 122	Whisker Growth on Sputtered Alsn (20-Wt-Percent Sn) Films Bergauer A, Bangert H, Eisenmengersittner C, Barna PB
123 - 127	Microstructural Modifications in Diamond-Like Carbon Thin-Films Caused by High-Energy Ion Irradiation Barshilia HC, Sah S, Mehta BR, Vankar VD, Avasthi DK, Jaipal, Mehta GK
128 - 131	In-Situ Stress Measurements of Co/Pd Multilayer Films Using an Optical Noncontact Displacement Detector Kim YS, Shin SC
132 - 136	Interface Properties of A-Si-H/A-Sicx-H Superlattice Chen GH, Guo YP, Yao JH, Song ZZ, Zhang FQ
137 - 142	Surface Segregation of Boron Atoms in Si and Strained Si1-xGex Layers During MBE Growth - Experiment and Simulation Kruger D, Osten HJ
143 - 150	XPS and AES Characterization of Sinx-H Layers Deposited by PECVD on Parylene-C - Effects of Thermal Treatments on Parylene-C Surfaces and Parylene-C Sinx-H Interlayers Beche E, Berjoan R, Viard J, Cros B, Durand J
151 - 158	Influence of Reactant Gas-Composition on Selected Properties of N-Doped Hydrogenated Amorphous-Carbon Films Wood P, Wydeven T, Tsuji O
159 - 169	A Quantitative Model for the Evolution from Random Orientation to a Unique Texture in PVD Thin-Film Growth Knuyt G, Quaeyhaegens C, Dhaen J, Stals LM
170 - 173	Experimental-Study of the Growth Evolution from Random Towards a (111) Preferential Orientation of PVD Tin Coatings Quaeyhaegens C, Knuyt G, Dhaen J, Stals LM
174 - 184	Zirconocene-Modified Polysiloxane-2-Pyridine Coatings Sugama T, Carciello N, Rast SL
185 - 193	Study and Improvement of the Adhesion of Chromium Thin-Films Deposited by Magnetron Sputtering Guilbaudmassereau V, Celerier A, Machet J
194 - 197	Improving the Passivating Efficiency of Conversion Films on Stainless-Steel by Thermal-Treatment Carmezim MJ, Carvalho FG, Figueiredo MO
198 - 204	Finite-Element Analysis of the Critical Ratio of Coating Thickness to Indentation Depth for Coating Property Measurements by Nanoindentation Sun Y, Bell T, Zheng S
205 - 212	Adhesion and X-Ray Elastic-Constant Evaluation of Crn Coating Attar F, Johannesson T
213 - 223	Optical-Properties of Thin-Films Up to 2nd-Order in the Thickness Haarmans MT, Bedeaux D
224 - 229	Attenuation, Scattering, and Absorption Properties of Light-Emitting Planar Wave-Guides Schrottke L
230 - 235	Rapid Thermal Processed Thin-Films of Reactively Sputtered Ta2O5 Pignolet A, Rao GM, Krupanidhi SB
236 - 246	Resistance Behavior and Interdiffusion of Layered Cuni-Nicr Films Bruckner W, Schumann J, Baunack S, Pitschke W, Knuth T
247 - 251	Surface-Plasmon-Enhanced Diffraction Orders in Polymer Gratings Fischer B, Rothenhausler B, Knoll W
252 - 259	Oxidation Behavior of Cu-Ni(Mn) (Constantan) Films Bruckner W, Baunack S, Reiss G, Leitner G, Knuth T
260 - 263	Indium Tin Oxide on InP by Pulsed-Laser Deposition Jia QX, Zheng JP, Kwok HS, Anderson WA
264 - 267	Epitaxial and Thermal Strains in Oxidic Thin-Films on Si(001) Matthee T, Wecker J, Bardal A, Samwer K
268 - 273	Sol-Gel-Derived Tin Oxide Thin-Films Park SS, Mackenzie JD
274 - 278	Effects of Oxygen Partial-Pressure on the Microstructure and Electrical-Properties of Indium Tin Oxide Film Prepared by DC Magnetron Sputtering Choi CG, No K, Lee WJ, Kim HG, Jung SO, Lee WJ, Kim WS, Kim SJ, Yoon C
279 - 282	Transient-Behavior of Thin-Film Transistors Based on Nickel Phthalocyanine Guillaud G, Benchaabane R, Jouve C, Gamoudi M
283 - 285	Radiation-Damage in Indium Tin Oxide (Ito) Layers Morgan DV, Salehi A, Aliyu YH, Bunce RW, Diskett D
286 - 291	Fast-Ion-Induced Fluorescence from J-Aggregate of Cyanine Dye in Langmuir-Blodgett-Films Asai K, Seki S, Sato T, Ishigure K, Shibata H
292 - 298	Effects of Nitrogen Trifluoride on the Properties of Plasma-Enhanced Chemical-Vapor-Deposited Semiinsulating Polysilicon Films Ranade RM, Ang SS, Brown WD
299 - 304	The Effect of a MgO Seed Layer on the Biepitaxial Growth of Y1Ba2Cu3O7-X Overlayers in Various Multilayered Thin-Films Lee S, Oh S, Goo D, Youm D
305 - 312	Interlayer Energy-Transfer Between Chromophoric Carbazole and Oxacyanine in Langmuir-Blodgett-Films - Site Selectivity of Trapping Ohta N, Okazaki S, Yoshinari S, Yamazaki I
313 - 316	Composition Monitoring Method in CuInSe2 Thin-Film Preparation Nishitani M, Negami T, Wada T
317 - 324	Charge-Transport in Thin-Films of Molecular Semiconductors as Investigated by Measurements of Thermoelectric-Power and Electrical-Conductivity Meyer JP, Schlettwein D, Wohrle D, Jaeger NI
325 - 332	Preparation and Characterization of Poly(Octyl 1,2-(2’,2"-Dithienylacrylate)) Thin-Films Jin ZS, Conn C, Unsworth J, Ediriweera RN, Kurusingal J, Pillai SM
333 - 335	Microstructure of Gold Grown by Ion-Induced Deposition Ro JS, Thompson CV, Melngailis J
336 - 340	Concentration-Dependent Redistribution of Arsenic in Silicon During Thermal-Oxidation Choi SS, Park MJ, Chu WK
341 - 346	Formation of Anodic Alumina Films in Tungstate Ethylene-Glycol Electrolyte Morlidge JR, Shimizu K, Skeldon P, Thompson GE, Wood GC
347 - 349	Activation-Energy of Hopping Conductivity in Low-Doped and Low-Compensated Semiconductor-Films Haroutunian SL, Haroutunian VA, Jivanian HA, Demirjian GH