Thin Solid Films

Thin Solid Films, Vol.281-282 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (170 articles)

1 - 4	Structural Study of Epitaxial-Growth on Silicon Surfaces Ichimiya A, Nakahara H, Tanaka Y
5 - 9	Structure and Growth Features of Tungsten Clusters Deposited on MgO(001) Surfaces Tanaka N, Kimata H, Kizuka T
10 - 13	Microstructure of Germanium Films Crystallized by High-Energy Ion Irradiation Nakao S, Saitoh K, Ikeyama M, Niwa H, Tanemura S, Miyagawa Y, Miyagawa S
14 - 16	Epitaxy of Co/Cu and Cu/Co Bilayers on MgO(111) Hayasaki H, Yamamoto M, Nishikawa K, Kingetsu T
17 - 19	Heteroepitaxial Growth of InSb(111) on Si(111) Kitabatake M, Kawasaki T, Korechika T
20 - 23	In-Situ Reflection Electron-Microscope Observation of 2-Dimensional Nucleation on Si(111) During Epitaxial-Growth Latyshev AV, Krasilnikov AB, Aseev AL
24 - 27	Surface-Structure of Single-Crystal CeO2 Layers Grown on Si Inoue T, Yamamoto Y, Satoh M, Ide A, Katsumata S
28 - 31	Heteroepitaxial Growth of Yttria-Stabilized Zirconia Film on Oxidized Silicon by Reactive Sputtering Horita S, Abe Y, Kawada T
32 - 35	Epitaxy of Titanium Nitride Thin-Films Grown by Nitrogen Implantation Kasukabe Y, Ootubo J, Takeda S, Nagata S, Kishimoto M, Fujino Y, Yamaguchi S, Yamada Y
36 - 38	Epitaxial-Growth of Silver on an Si(111) Root-3X-Root-3 Au Surface at Room-Temperature Ichimiya A, Iwashige H, Lijadi M
39 - 42	Heteroepitaxy of KCl on KBr Substrate Natori A, Tanaka A, Yasunaga H
43 - 45	Impurity Doping During Pb1-Xsnxse/CaF2 Epitaxial-Growth Suzuki M, Seki T
46 - 51	Crystalline Quality of Alpha-Fe Films on Si(111) and Ge(111) Substrates Grown by Direct Ion-Beam Deposition Shimizu S, Sasaki N
52 - 56	Langmuir Probe Evaluation of Ion-Bombardment During Ti-N Growth by Unbalanced Magnetron Sputtering Wiemer C, Levy F, Messier R
57 - 59	An Atomic-Force Microscopy Study of Thin Copper-Oxide Films Grown by Molecular-Beam Epitaxy on MgO(100) Brazdeikis A, Karlsson UO, Flodstrom AS
60 - 63	Growth of CeO2 Thin-Films by Metal-Organic Molecular-Beam Epitaxy Ikegawa S, Motoi Y
64 - 67	Thermodynamic-Equilibrium and Mass-Transport Coupled Modeling of the Chemical-Vapor-Deposition Process Rouch H, Pons M, Benezech A, Bernard C, Madar R
68 - 72	Monte-Carlo Simulation of the Variation of a Binary Alloy Film Composition Due to Intrinsic Resputtering Using Different Working Gases Bauer W, Betz G, Bangert H, Bergauer A, Eisenmengersittner C
73 - 75	Phase-Transitions in Ultrathin Al Films on Si(111) Surfaces Groger R, Vonblanckenhagen P
76 - 79	Ultrathin-Film of Cu on Alpha-Fe2O3(0001) Moller PJ, Guo QL, Gui LL
80 - 83	In-Situ Observation of the Inplane Structure of C60 Thin-Films on Metal Substrates Prepared by Molecular-Beam Deposition Yoshida Y, Tanigaki N, Yase K
84 - 89	Difference of Si Nodules Precipitating from Al-X Wt-Percent Si (X=0.5-Similar-to-3.3) Noritake C, Kondo I, Kondo K, Takenaka O, Kinbara A
90 - 93	Chemical-State Analysis of Surface and Interface Segregates in Coevaporated Al-Sn-O Systems Kover L, Barna PB, Sanjines R, Kovacs Z, Margaritondo G, Adamik M, Radi Z
94 - 97	Thin-Film Silicon Compound Growth Mechanisms - CrSi2/Si(001) Heck C, Kusaka M, Hirai M, Iwami M, Yokota Y
98 - 101	Initial Plasma Oxidation-Kinetics of Silicon - DC Bias Effects Kamioka I, Nakamura KG, Kawabe T, Kitajima M
102 - 104	Energy-Selective Electron-Cyclotron-Resonance Plasma for Controlled Surface-Reaction Processes Okeeffe P, Mutoh H, Den S, Hayashi Y, Komuro S, Morikawa T
105 - 107	The Role of Neutral Oxygen Radicals in the Oxidation of Ag Films Schmidt AA, Offermann J, Anton R
108 - 111	Model of Oxidation of Tin in Ion-Beam-Assisted Deposition Process Kubota H, Easterbrook M, Tokunaga M, Sakata I, Nagata M, Nicolet MA
112 - 116	Electron-Beam-Induced Oxidation of Indium Particles Embedded in a Plasma Polymer Thin-Film Matrix Muller AD, Heilmann A, Muller F
117 - 119	In-Depth Concentration Profile Equation for Cations in Thin Oxide Film Under the Inverse Logarithmic Growth Law of Low-Temperature Oxidation Ishikawa I
120 - 123	Oxygen-Adsorption and Desorption Induced Surface Phase-Transition of SrCuO2(001) Ogasawara H, Sakuma T, Tsukakoshi M, Kawai M
124 - 127	Comments on the Interdiffusivities Evaluated by the Decay-Rate of the Satellite Peak Measured by X-Ray-Diffraction Nittono O, Ando S
128 - 131	Microstructure and Preferred Orientation in Pure Titanium Films Deposited by 2-Facing-Target-Type DC Sputtering Miyoshi T, Haga Y, Nittono O
132 - 135	Columnar Structures in Fe-Based Metallic Multilayers Prepared with the Facing-Target-Type DC Sputtering Method Haga Y, Nittono O
136 - 142	Large-Area Deposition - Sputtering-Systems and Pcvd-Systems and Techniques for LCD Hosokawa N
143 - 145	Remote Deposition of Scratch Resistant Films by Use of Slot Antenna Microwave Plasma Source Korzec D, Traub K, Werner F, Engemann J
146 - 148	Generation of Large-Area Disk-Shaped ECR Plasma for Diamond Deposition Murai A, Ohya I, Yasui T, Tahara H, Yoshikawa T
149 - 151	A Rectangular Large ECR Plasma Source Tada S, Miyazawa W, Sakamoto Y, Den S, Hayashi Y
152 - 154	Sheet-Shaped ECR Plasma Generation Using Permanent-Magnets for Material Processing Nakase K, Shibata T, Yasui T, Tahara H, Yoshikawa T
155 - 158	Plasma-Enhanced CVD of Tin and Ti Using Low-Pressure and High-Density Helicon Plasma Tobe R, Sekiguchi A, Sasaki M, Okada S, Hosokawa N
159 - 161	Thermoelectric-Power of Polycrystalline Si Films Prepared by Microwave Plasma Chemical-Vapor-Deposition Yonekubo S, Kamimura K, Onuma Y
162 - 165	The Enhancement of Plasma Confining Effect at Low Gas-Pressure in the Sputtering Apparatus with Floating Potential Cathode Takahashi T, Iwatubo S, Asada M, Naoe M
166 - 168	Effects of Magnet Behind the Target on Discharge and Sputtering Characteristics in the Sputtering Apparatus Takahashi T, Iwatubo S, Asada M, Naoe M
169 - 171	New Plasma Source with an UHF (500 MHz) Antenna Nakagawa Y, Samukawa S, Ueyama H, Tsukada T, Shinohara K
172 - 174	Excited Oxygen Beam by RF Type Multicapillary Ion-Source Okamoto A, Ogawa S, Ueno T, Fukui S
175 - 178	Thin-Film Growth Using a High-Current, Mass-Separated Low-Energy Ion-Beam Deposition System Sasaki N, Shimizu S, Ogata S
179 - 181	Transparent, Conductive Cui Films Prepared by RF-DC Coupled Magnetron Sputtering Tanaka T, Kawabata K, Hirose M
182 - 185	Tin Films Prepared by Unbalanced Planar Magnetron Sputtering Under Control of Photoemission of Ti Tominaga K, Inoue S, Howson RP, Kusaka K, Hanabusa T
186 - 189	Requirements for Sputtering Magnetic-Alloys on Organic Film Lippens P, Lievens H
190 - 193	A Theory on Planar Magnetron Discharge Miura T, Asamaki T
194 - 197	Ito Films Prepared by Facing Target Sputtering System Tominaga K, Ueda T, Ao T, Kataoka M, Mori I
198 - 201	Large-Area Deposition of Ito Films by Cluster Type Sputtering System Ishibashi K, Watabe K, Hosokawa N
202 - 205	Crystal-Growth of Ito Films Prepared by DC Magnetron Sputtering on C Film Morikawa H, Sumi H, Kohyama M
206 - 208	The Effects of Oxygen-Content on Electrical and Optical-Properties of Indium Tin Oxide-Films Fabricated by Reactive Sputtering Honda S, Watamori M, Oura K
209 - 212	Ozone in Reactive Gas for Producing Tin-Doped Indium Oxide-Films by DC Reactive Magnetron Sputtering Alam AH, Sasaki K, Hata T
213 - 217	High-Rate Deposition of SiO2 by Modulated DC Reactive Sputtering in the Transition Mode Without a Feedback-System Ohsaki H, Tachibana Y, Shimizu J, Oyama T
218 - 222	Physical-Properties of Evaporated Molybdenum Oxide-Films Miyata N, Suzuki T, Ohyama R
223 - 227	DC Reactive Sputtering of Electroconductive Transparent Tin Suboxide Using a Sn-O-2/Ar System Ohsaki H
228 - 231	Highly Conductive Transparent F-Doped Tin Oxide-Films Were Prepared by Photo-CVD and Thermal-CVD Ishida T, Tabata O, Park JI, Shin SH, Magara H, Tamura S, Mochizuki S, Mihara T
232 - 234	Thin-Film Used to Obtain a Constant-Temperature Lower Than the Ambient Tazawa M, Jin P, Tanemura S
235 - 238	Characterization of Niobium Oxide Electrochromic Thin-Films Prepared by Reactive DC Magnetron Sputtering Yoshimura K, Miki T, Iwama S, Tanemura S
239 - 242	V1-Xmoxo2 Thermochromic Films Deposited by Reactive Magnetron Sputtering Jin P, Tanemura S
243 - 245	Influence of Deposition Parameters on Layer Structure of Ag/C Multilayer Zone Plates for Use in Hard X-Ray Region Tamura S, Ohtani K, Kamijo N, Suzuki Y, Kihara H
246 - 248	Modeling of Lift-Off Sputter-Deposition and Application to Fabrication of a Microlens Serikawa T, Shirai S
249 - 251	Study of Optical Transient Relaxation of an Ag-O-Ba Thin-Film Wu JL, Wang CM, Wu QD, Xia ZJ, Zou YH
252 - 255	Synthesis of Beta-Fesi2 for Optical Applications by Fe Triple-Energy Ion-Implantation into Si(100) and Si(111) Substrates Katsumata H, Makita Y, Kobayashi N, Hasegawa M, Shibata H, Uekusa S
256 - 259	Diamond (111) and (100) Surface Reconstructions Scholze A, Schmidt WG, Bechstedt F
260 - 263	In-Situ Optical Characterization of Carbon Layers Formed in the Initial-Stages of Diamond Growth Longueville JL, Moulin S, Bonnot AM
264 - 266	Diamond Film Growth by Pulse-Modulated Magnetoactive Microwave Plasma Chemical-Vapor-Deposition Hatta A, Suzuki H, Kadota K, Ito T, Hiraki A
267 - 270	Electrical-Properties of Boron-Doped Diamond Films Prepared by Microwave Plasma Chemical-Vapor-Deposition Deguchi M, Kitabatake M, Hirao T
271 - 274	Ion-Implantation in Predoped CVD Diamond Yagyu H, Deguchi M, Mori Y, Hatta A, Ito T, Kitabatake M, Sakakima H, Hirao T, Hiraki A
275 - 278	Formation of Paramagnetic Defects in CVD Diamond Films (ESR Study) Show Y, Nakamura Y, Izumi T, Deguchi M, Kitabatake M, Hirao T, Mori Y, Hatta A, Ito T, Hiraki A
279 - 281	Ultrahigh Particle Density Seeding with Nanocrystal Diamond Particles Makita H, Nishimura K, Jiang N, Hatta A, Ito T, Hiraki A
282 - 284	Electron-Microscopic Analysis of Chemical-Vapor-Deposited Diamond Surface by a Novel Method Jiang N, Hatta A, Won J, Mori Y, Ito T, Sasaki T, Hiraki A
285 - 288	Study of Diamond Synthesized by Simple Hot-Filament-Assisted CVD in Various Conditions Kondo H, Endo T, Toyoshima K, Hirayoshi Y
289 - 293	Carbon Nitride Thin-Films Deposited by the Reactive Ion-Beam Sputtering Technique Kobayashi S, Nozaki S, Morisaki H, Fukui S, Masaki S
294 - 297	Fluorine-Containing Amorphous Hydrogenated Carbon-Films Durrant SF, Landers R, Kleiman GG, Castro SG, Demoraes MA
298 - 301	Oxidation of Tin, Zrn, Tizrn, Crn, Ticrn and Tin/Crn Multilayer Hard Coatings Reactively Sputtered at Low-Temperature Panjan P, Navinsek B, Cvelbar A, Zalar A, Milosev I
302 - 304	The Effects of Tl Impurities on the Properties of Amorphous SiC-H Films Prepared by Cosputtering Saito N, Inui Y, Yamaguchi T, Nakaaki I
305 - 307	Improvement in the Stability of Amorphous Sin-BN Films Prepared by Hybrid-Plasma-Enhanced Chemical-Vapor-Deposition Yasui K, Itoh H, Akahane T
308 - 310	Electrical, Optical and Structural-Properties of A-Singe-H Films Prepared by the RF Glow-Discharged Decomposition Nakaaki I, Saito N
311 - 313	Highly Adhesive Tin Thin-Films Prepared on Glass by the Electron Shower Method Yumoto H, Kaneko K, Ishihara M, Kato Y, Akashi K
314 - 317	X-Ray-Absorption and X-Ray Photoelectron Spectroscopic Studies of Air-Oxidized Chromium Nitride Thin-Films Esaka F, Shimada H, Imamura M, Matsubayashi N, Sato T, Nishijima A, Kawana A, Ichimura H, Kikuchi T, Furuya K
318 - 320	Electron-Energy-Loss Fine-Structure Measurements of Silicon-Nitride Films Tsukajima J, Arai K, Takatoh S, Enokijima T, Hayashi T, Yikegaki T, Kashiwagi A, Tokunaga K, Suzuki T, Fujikawa T, Usami S
321 - 323	Effect of Bias Voltage on AlN Thin-Films Prepared by Electron Shower Method Ishihara M, Yumoto H, Tsuchiya T, Akashi K
324 - 326	Effects of RF Bias on Cubic BN Film Synthesis by Pulsed Nd-YAG Laser Deposition Suda Y, Nakazono T, Ebihara K, Baba K
327 - 330	Boron-Nitride Hard Coatings by Ion-Beam and Vapor-Deposition Nishiyama S, Takahashi E, Iwamoto Y, Ebe A, Kuratani N, Ogata K
331 - 333	Tribological Properties of RF Pacvd Amorphous B-N-C Coatings Dekempeneer EH, Meneve J, Kuypers S, Smeets J
334 - 336	Structural and Electrical Characterization of Bc2N Thin-Films Watanabe MO, Sasaki T, Itoh S, Mizushima K
337 - 339	Stress-Strain Curves of Sputtered Thin-Films of Ti-Ni Ishida A, Takei A, Sato M, Miyazaki S
340 - 343	Effect of Nitrogen Gas-Pressure on Residual-Stress in AlN Films Deposited by the Planar Magnetron Sputtering System Kusaka K, Hanabusa T, Tominaga K
344 - 347	Residual-Stress and Its Thermal Relaxation in Tin Films Matsue T, Hanabusa T, Ikeuchi Y
348 - 351	Mechanisms of Reduction of the Internal-Stress in Hydrogenated Silicon-Oxide Films Prepared by Ar-H-2 Sputtering Takahashi H, Nishiguchi A, Nagata H, Kataoka H, Fujishima M
352 - 355	Study on the Internal-Stress in Nickel Films Deposited Onto Silicon Substrates by Ion-Beam and Vapor-Deposition (Ivd) Kuratani N, Murakami Y, Imai O, Ebe A, Nishiyama S, Ogata K
356 - 359	Improvement of the Adhesion to Polyimide Substrates of Copper-Films Prepared by an Ion-Beam and Vapor-Deposition (Ivd) Method Ebe A, Takahashi E, Iwamoto Y, Kuratani N, Nishiyama S, Imai O, Ogata K, Setsuhara Y, Miyake S
360 - 363	Adhesion Fracture of a 2-Layer Au Evaporated Film with C, W and Cr Mixed Hosaka T
364 - 367	Martensitic Transformations in Sputter-Deposited Ti-Ni-Cu Shape-Memory Alloy Thin-Films Miyazaki S, Hashinaga T, Ishida A
368 - 371	Electron-Transport in Percolating Gold-Films Dumpich G, Friedrichowski S, Mikitisin P
372 - 374	Fabrication and Characterization of Cuin(Sxse1-X)(2) Thin-Films Deposited by RF-Sputtering Yamamoto Y, Yamaguchi T, Demizu Y, Tanaka T, Yoshida A
375 - 378	(Cd,Zn)S Thin-Films Prepared by Chemical Bath Deposition for Photovoltaic Devices Yamaguchi T, Yamamoto Y, Tanaka T, Demizu Y, Yoshida A
379 - 382	Novel GaAs Photocathodes with Alkali Antimonide Intermediate Layers and Cesium-Oxygen Adlayers Guo TL
383 - 385	Negative-Resistance Characteristics and Memory Phenomena in Electroformed Planar Metal-Films Nakashima H, Uozumi K
386 - 389	Photoluminescence Analysis of CdS Thin-Films Under Phase-Transition Lozadamorales R, Zelayaangel O
390 - 392	Structure of Gold-Hydrocarbon Composite Thin-Films Deposited Using Low-Voltage Plasma Sputtering Method Okamoto A, Nosaka T, Yoshitake M, Suzuki Y, Ogawa S
393 - 396	Preparation of Pd Thin-Film Photo-Cathodes Using Ion-Beam Sputtering Nosaka T, Yoshitake M, Okamoto A, Suzuki Y, Ogawa S, Mima H
397 - 400	High-Quality SiO2 Depositions from Teos by ECR Plasma Sano K, Hayashi S, Wickramanayaka S, Hatanaka Y
401 - 403	Deposition of SiO2 and Ta2O5 Films by Electron-Beam-Excited Plasma Ion Plating Toki K, Kusakabe K, Odani T, Kobuna S, Shimizu Y
404 - 408	Surface-Properties of SiOx Monolayer Photochemically Formed on Oxide Semiconductors Tada H, Tanaka M
409 - 411	FTIR Spectroscopy and AES Study of Water Containment in SiO2 Thin-Films Demsar A, Colaric B, Rus S, Lindav J, Svegelj F, Orel B, Pracek B, Zalar A
412 - 414	Thin Si Oxide-Films for MIS Tunnel Emitter by Hollow-Cathode Enhanced Plasma Oxidation Usami K, Takahashi I, Miyake E, Moriya M, Cai XY, Kobayashi T, Goto T
415 - 418	Tantalum Oxide-Films on Silicon Grown by Tantalum Evaporation in Atomic Oxygen Hudner J, Hellberg PE, Kusche D, Ohlsen H
419 - 422	Growth and Characterization of Ta2O5 Thin-Films on Si by Ion-Beam Sputter-Deposition Park KS, Lee DY, Kim KJ, Moon DW
423 - 426	Investigation of the Effects of Pumping Speed and Ar/O-2 Ratio on the Transient Time at Mode Transition in Ti-O-2 Reactive Sputtering Kusano E, Kinbara A
427 - 430	Characteristics of Rutile TiO2 Films Prepared by RF Magnetron Sputtering at a Low-Temperature Okimura K, Maeda N, Shibata A
431 - 435	Surface-Morphology of Tiox Films Prepared by an Ion-Beam-Assisted Reactive Deposition Method Sasase M, Miyake K, Yamaki T, Takano I, Isobe S
436 - 440	The Structural Characteristics of Vox Films Prepared by He-Introduced Reactive RF Unbalanced Magnetron Sputtering Miyazaki H, Utsuno F, Shigesato Y, Yasui I
441 - 444	Velocity Analysis of Ablated Particles in Pulsed-Laser Deposition of NiO Film Tasaka Y, Kuroda H, Tanaka M, Usami S
445 - 448	Preparation and Some Properties of Nitrogen-Mixed ZnO Thin-Films Sato Y, Sato S
449 - 452	Growing BaTiO3 Thin-Films on Si(100) with MgO-Buffer Layers by Sputtering Kim S, Hishita S
453 - 456	Transition-Metal Oxide-Films Prepared by Pulsed-Laser Deposition for Atomic-Beam Detection Tanaka M, Mukai M, Fujimori Y, Kondoh M, Tasaka Y, Baba H, Usami S
457 - 459	C-Axis-Oriented PbTiO3 Thin-Films Prepared by Sputter-Assisted Plasma CVD Mihara T, Mochizuki S, Makabe R
460 - 462	Oxidation of Zn Films by Irradiation with an Excited Metastable He Beam Koyanagi T, Fujii T, Oi R, Hironaga N, Matsubara K
463 - 465	Preparation of PbTiO3 Thin-Films by Ion-Beam Sputtering Hashima H, Nakajima S, Suzuki Y, Ogawa S
466 - 468	Selective Gas-Detection by Means of Surface-Plasmon Resonance Sensors Miwa S, Arakawa T
469 - 473	Magnetic-Structure and Magnetoresistance of Metallic Multilayers Shinjo T
474 - 483	Magnetic Thin-Films for High-Density Recording Lodder JC
484 - 487	Magnetic and Structural-Properties of Fe Films Deposited by Ion-Beam Sputtering with a High-Energy Assisted Process Iwatsubo S, Takahashi T, Naoe M
488 - 491	Growth-Kinetics of Thin Oxide Layers - Oxidation of Fe and Fe-N Phases at Room-Temperature Kooi BJ, Somers MA, Mittemeijer EJ
492 - 495	Metastable Spin-States and Magnetic Anisotropies of Thin fcc Fe-Layers on Cu(100) Lorenz R, Hafner J
496 - 498	Magnetoresistance and Magnetic-Properties of Ferromagnetic Multilayers Gondo Y, Suezawa Y
499 - 502	Growth of Mnsb and Mn2Sb Epitaxial Layers on GaAs Substrates by Hot-Wall Epitaxy Tatsuoka H, Kuwabara H, Oshita M, Nakamura T, Fujiyasu H
503 - 506	Preparation of Films of (Tb,Dy)Fe-2 Giant Magnetostrictive Alloy by Ion-Beam Sputtering Process and Their Characterization Wada M, Uchida HH, Matsumura Y, Uchida H, Kaneko H
507 - 509	Xe+-Beam Sputtered YBa2Cu3Ox Thin-Films on Si Wafers Hatanaka K, Yokota K, Fujimoto H, Itoh T, Tatsumi M, Watanabe M, Takagi T
510 - 512	The Influence of Bi-Sticking Coefficient in the Growth of Bi(2212) Thin-Film by Ion-Beam Sputtering Migita S, Sakai K, Ota H, Mori Z, Aoki R
513 - 516	Digital Laser Etching of Bi-Sr-Ca-Cu-O Superconducting Thin-Films Oohira T, Sakai S, Kasai Y, Shimizu K
517 - 520	Comparison Between Bi-Superconductor Thin-Films Fabricated via Codeposition and Layer-by-Layer Deposition by Ion-Beam Sputtering Method Mori Z, Ota H, Migita S, Sakai K, Aoki R
521 - 524	2-Dimensionally Oriented Organic-Molecules as a Substrate for Vapor Growth of Zinc Thin-Films Lin H, Ando H, Seo WS, Kuwabara K, Koumoto K
525 - 528	Quantitative Estimation of Organic Molecular-Beams by Using Quadrupole Mass-Spectroscopy Yase K, Yoshida Y
529 - 532	Changes in Surface-Morphology and Optical-Properties of Polymers Induced by Ion-Implantation Ikeyama M, Hayakawa Y, Tazawa M, Nakao S, Saitoh K, Miyagawa Y, Miyagawa S
533 - 535	Improvement of the Partial Discharge Resistance of Polymer-Films by Coating with Plasma-Polymerized Films Kusabiraki M, Aozasa M
536 - 538	Plasma-Polymerized Acetylene Thin-Film by Pulsed Discharge Uchida T, Senda K, Vinogradov GK, Morita S
539 - 541	Time-Dependence of Current of Plasma-Polymerized Polystyrene Thin-Film upon Exposure to NO2 Gas Takeda S
542 - 544	Direct Observation of the Crystallization in El Organic Thin-Films by Total-Reflection X-Ray Diffractometer Orita K, Hayashi K, Horiuchi T, Matsushige K
545 - 547	Production of a Bridge Structure Using Diamond Film Hoshikawa K, Kobayashi K, Watanabe T, Togashi F
548 - 551	Surface-Structure of a Fluorinated Thiol on Au(111) by Scanning Force Microscopy Motomatsu M, Mizutani W, Nie HY, Tokumoto H
552 - 555	Microstructure of Spark-Processed Blue Luminescent CdTe, GaSb, and InSb Gudinomartinez A, Falcony C, Vazquezlopez C, Navarro H, Vidal MA, Araujoosorio J, Cabanasmoreno JG
556 - 561	Surface Geometry of MBE-Grown GaAs(001) Surface Phases Xue QK, Hashizume T, Sakata T, Hasegawa Y, Ichimiya A, Ohno T
562 - 567	Investigation of Thin-Film Transistors Using a Combination of Focused Ion-Beam Etching and Cross-Sectional Transmission Electron-Microscopy Observation Tsuji S, Tsujimoto K, Tsutsui N, Miura N, Kuroda K, Saka H
568 - 571	N-2-Plasma-Nitridation Effects on Porous Silicon Yokomichi H, Masuda A, Yonezawa Y, Shimizu T
572 - 575	Electrochemical Nanolithography Using Scanning Probe Microscopy - Fabrication of Patterned Metal Structures on Silicon Substrates Sugimura H, Nakagiri N
576 - 579	Instrumentation of a Wafer Inspection Large-Sample Atomic-Force Microscope Yasutake M, Wakiyama S, Kitamura M, Fujino N, Karino I, Oumori M
580 - 583	Simulation of Atomic-Force Microscopy Image Variations Due to Tip Apex Size - Appearance of Half Spots Komiyama M, Tazawa K, Tsujimichi K, Hirotani A, Kubo M, Miyamoto A
584 - 587	Properties of Nanophase Grains of Superconducting YBCO Prepared by Wet-Type Jet Mill Kezuka H, Xi ZH, Miyanaga Y, Kannari C
588 - 590	STM Modification of MoS2 in the Nanometer-Scale Using a Gas-Solid Reaction Kohno M, Doi T, Hasegawa T, Tomimatsu S, Hosoki S
591 - 593	Reconstruction of Heat-Treated 6H-SiC(0001) Surfaces - AES, STM Hirai M, Marumoto Y, Tsukamoto T, Kusaka M, Iwami M, Ozawa T, Nagamura T, Nakata T
594 - 597	Scanning-Tunneling-Microscopy Study on Dynamic Structural Formation in Mixed Fatty-Acid Monolayers at Liquid/Graphite Interface Hibino M, Sumi A, Hatta I
598 - 601	Molecular-Dynamics Simulation of Traction Fluid Molecules Under Ehl Condition Yamano H, Shiota K, Miura R, Katagiri M, Kubo M, Stirling A, Broclawik E, Miyamoto A, Tsubouchi T
602 - 605	Initial-Stage of C-60 Film Growth and Reaction on Si(111) 7X7 and Graphite Surfaces Studied by HREELS-STM Suto S, Kasuya A, Hu CW, Wawro A, Sakamoto K, Goto T, Nishina Y
606 - 609	Nanofabrication on N-GaAs Surface Using a Scanning Tunneling Microscope in a Ni-Salt Solution Kaneshiro C, Okumura T
610 - 612	Visible-Light Emission from the Porous Alloyed Pt/Si Contacts Ichinohe T, Nozaki S, Morisaki H
613 - 617	High-Resolution Electron-Microscopy of Gd-at-C-82 Metal Fullerenes Grown on MgO(001) Surfaces Tanaka N, Honda Y, Kawahara M, Kishida M, Shinohara H
618 - 623	C60 Single-Crystal Films on GaAs(001) Surfaces Xue QK, Ling Y, Ogino T, Sakata T, Hasegawa Y, Hashizume T, Shinohara H, Sakurai T
624 - 629	Friction-Force Microscopy of Peptide Filament - An Application to Estimate the Size of a Supramolecular Unit Masai J, Shibataseki T, Ogawa Y, Sato K, Yanagawa H
630 - 633	New Fast Atom Beam Processing with Separated Masks for Fabricating Multiple Microstructures Ichiki K, Hatakeyama M, Tanaka S, Nakao M, Hatamura Y
634 - 636	Development of a Mesoscale/Nanoscale Plasma Generator Terashima K, Howald L, Haefke H, Guntherodt HJ
637 - 639	Scanning Tunneling Microscope-Induced Oxidation of Hydrogen Passivated Silicon Surfaces Kramer N, Vandenberg MR, Schonenberger C
640 - 643	Nanoscale Al Patterning on an STM-Manipulated Si Surface Ono T, Hamanaka H, Kurabayashi T, Minami K, Esashi M
644 - 646	Development of UHV-STM/STS at 2 K Hattori K, Iimori T, Komori K
647 - 650	Development of a Near-Field Optical-System for Investigating Thin Organic Films Nagahara LA, Tokumoto H
651 - 653	Micromachine-Actuator Rotated by Rarefied-Gas Effects Kasahara K, Ota M, Sakamoto M